Rasirc, Inc.

Aeronex, Inc.

Entegris, Inc.

Mykrolis Corporation

Other

3m Innovative Properties Company

Matheson Tri-gas, Inc.

Daniel Alvarez, Jr

Jeffrey J Spiegelman

Russell J Holmes

Joshua T Cook

Edward Heinlein

Christopher Ramos

James John Hogan

Jian Yang

Richard Dean Blethen

Allan Tram

Ericca Lynne Speed

Arthur Deptala

Peter K Shogren

Zohreh Shamsi

Alexander David Deptala

James Gregory Bentsen

Ralph R Roberts

Orlin Bruce Knudson

Michael John Rude

Troy B Scoggins

Mark Raynor

Daniel Tempel

Hideharu Shimizu

Robin Gardiner

Tram Doan Nguyen

Daniel A Lev

Alex Deptala

Jeremiah Trammel

Alexander Deptala

The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing an amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; and (b) forming a hydroxyl layer on the surface of the material within a chamber. The hydroxyl layer can decrease an amount or rate of hydrogen degradation of the material when exposed to hydrogen. In some embodiments, a system includes: a chamber; a material within the chamber; an inlet to the chamber; a hydrogen peroxide source coupled to the inlet via a conduit; and an outlet from the chamber for removing species from the chamber. The system can be configured to perform the method for decreasing an amount or rate of hydrogen degradation of a material.

Suppression of hydrogen degradation

Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.

Method, system, and device for storage and delivery of process gas from a substrate

The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing the amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; (b) forming a hydroxyl layer on the surface of the material within a chamber; and (c) after forming the hydroxyl layer, exposing the material to hydrogen during a controlled process or application.

The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).

Removal of moisture from hydrazine

Compositions, methods, devices, and systems for purifying a source liquid from a replenishment stock solution that includes stabilizing agents, such as metal ions, prior to vaporization. Certain embodiments effect the purification with a solid perfluoronated ionomer, such as a perfluoronated ionomer membrane. Advantageously, source liquids purified in this manner provide feed stocks for production of ultra-pure gaseous reagents. As well, performance characteristics of membrane-based vaporizers relying on transport processes are improved.

Methods and systems for purifying hydrogen peroxide solutions

A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

Method, system, and device for delivery of process gas

Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Methods and systems for delivering process gases to critical process applications

Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

Methods, systems, and devices for decontaminating materials containing biological or biologically derived materials, such as microorganisms or DNA products, are provided. The methods, systems, and devices may be used for decontaminating or sterilizing materials, such as surfaces, including, but not limited to reducing the number of viable microorganisms on surfaces. The methods, systems, and devices may further be used for rendering DNA non-amplifiable in nucleic acid amplification reactions that synthesize DNA amplification products.

Method and system for decontaminating materials

A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase. The system further includes a pre-loaded carrier gas source that is in fluid contact with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the liquid source and an apparatus for delivering a gas stream including at least one component of the liquid source, wherein the amount of the component in the pre-loaded carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant.

Method of delivering a process gas from a multi-component solution

A method and chemical delivery system are provided. The method includes providing a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The method further includes contacting a carrier gas or vacuum with the vapor phase and delivering a gas stream comprising hydrogen peroxide to a critical process or application. The chemical delivery system includes a non-aqueous hydrogen peroxide solution having a vapor phase separated from the substantially non-aqueous hydrogen peroxide solution by a membrane. The system further includes a carrier gas or vacuum in fluid contact with the vapor phase and an apparatus for delivering a gas stream comprising at least one component of the hydrogen peroxide solution to a critical process or application.

Method, system, and device for delivery of high purity hydrogen peroxide

A method of purifying a hydrogen stream using an electrochemical cell having an enclosed electrically conductive cylindrical outer shell and a hollow wet polymeric membrane located within and parallel to the longitudinal axis of the cylindrical member which provides an inner compartment and an outer compartment. An electrode having a longitudinal axis is located within the inner compartment and is spaced from the hollow polymeric membrane. A gas inlet for feeding a hydrogen stream that is to be purified communicates with the inner compartment and a gas outlet is provided for passing purified hydrogen gas thru the cylindrical outer shell. The electrode within the hollow wet polymeric membrane is connected to an anode terminal of a dc supply with an electrical conductor and the outer shell of the cylindrical shaped member is connected to a cathode terminal of the dc supply with another electrical conductor.

Growing community of inventors

Oceanside, CA, United States of America

Daniel Alvarez, Jr