Nanjing University

Danfeng Pan

Bin Liu

Rong Zhang

Xuan Wang

Xiangqian Xiu

Zili Xie

Di Jiang

Yugang Zhou

Junchi Yu

Dunjun Chen

A micro panchromatic QLED array device based on a quantum dot transfer process of deep silicon etching templates. Array-type square table structures pass through a p-type GaN layer and a quantum well active layer and are deep to an n-type GaN layer are disposed on a blue LED epitaxial wafer, wherein micro holes are formed through etching in the structures. Every 2*2 table structures constitute an RGB pixel unit. Among the four micro holes, three of the holes are filled with red light, green light and yellow light quantum dots respectively, and one of the holes emits blue light/is filled with a blue light quantum dot. Micro holes in a silicon wafer are formed through etching with a deep silicon etching technology; the micro holes in the silicon wafer are aligned with quantum dot filling areas on a micro-LED.

Micro panchromatic QLED array device based on quantum dot transfer process of deep silicon etching templates, and preparation method therefor

Growing community of inventors

Nanjing, China

Danfeng Pan