Asml Holding N.v.

Asml Netherlands B.v.

Damoon Sohrabibabaheidary

Matthew Lipson

Christopher John Mason

Michael Perry

Jimmy Matheus Wilhelmus Van De Winkel

Bert Dirk Scholten

David Hart Peterson

Mehmet Ali Akbas

Tammo Uitterdijk

Peter Helmus

Jerry Jianguo Deng

A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

Method to manufacture nano ridges in hard ceramic coatings

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

Substrates and methods of using those substrates

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Norwalk, CT, United States of America

Damoon Sohrabibabaheidary