Metrosol Limited

Vuv Analytics, Inc.

Jordan Valley Semiconductors Ltd.

Jordan Valley Semiconductor Ltd

Dale A Harrison

Phillip Walsh

Anthony T Hayes

Matthew Weldon

Jeffrey B Hurst

Cristian Rivas

Sean H Jameson, Jr

Philip Walsh

In one embodiment, an improved gas analysis system having a gas flow cell is provided. In another embodiment an improved gas flow cell is provided. As disclosed herein, dead volumes in a gas flow channel of a gas flow cell may be minimized through the use of one or more additional gas inlets. In one embodiment, an additional gas inlet is located between an analyte gas inlet and a light entrance optical coupling of the gas flow cell. In another embodiment, an additional gas inlet is located between an analyte gas outlet and a light exit optical coupling of the gas flow cell. In addition, enclosed regions may be formed adjacent seals of the gas flow channel of the gas flow cell. The enclosed regions may be evacuated and/or purged so as to minimize the passage of contaminants through the seals into the gas flow channel.

Vacuum ultraviolet absorption spectroscopy system and method

An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids.

Analysis of chemically samples using gas chromatography (GC) separation with vacuum ultra-violet spectroscopy detection is described. One technique focuses on assigning a specific analysis methodology to each constituent in a sample. Constituents can elute from the GC by themselves or with other constituents, in which case a deconvolution is done using VUV spectroscopic data. In an exemplary embodiment, each constituent may be specifically included in an analysis method during a setup procedure, after which the same series of analyses are done on subsequent sample runs. The second approach essentially integrates an entire chromatogram by first reducing it into a series of analysis windows, or time slices, that are analyzed automatically. The analysis at each time slice determines the molecular constituents that are present as well as their contributions to the total response. Either approach can be used to quantify specific analytes or to do bulk classification.

Method for detailed and bulk classification analysis of complex samples using vacuum ultra-violet spectroscopy and gas chromatography

A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region.

Methods and apparatus for vacuum ultraviolet (VUV) or shorter wavelength circular dichroism spectroscopy

An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described. Focusing optics focus light onto the sample and collect the light reflected from the sample so as to record an optical response from nanoimprint structures on the sample, wherein the nanoimprint structures have an orientation that varies over a surface of the sample. A sample stage is configured to support the sample. At least one computer is connected to the metrology instrument and the sample stage and is configured to run a computer program which causes the sample stage to rotate the sample so as to present multiple different locations on the sample to the optical metrology instrument such that the orientation of the nanoimprint structures at the multiple different locations remains fixed with respect to a plane of the focusing optics of the metrology instrument in order to eliminate polarization effects.

Optical vacuum ultra-violet wavelength nanoimprint metrology

A highly efficient polarization device for use in the VUV or shorter wavelength is provided. The polarization device may include a dispersive element capable of splitting an incident un-polarized beam of light into two beams of orthogonal linear polarization through introduction of an angular deviation. The polarization device may also include a focusing element capable of focusing at least a portion of one of the linearly polarized beams to a small region. Said polarization device may also incorporate a spatial aperture through which most of one of the beam passes, but through which most of the other does not.

Polarization device for vacuum ultraviolet or shorter wavelengths

A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-&#x3b8; stage to further reduce the footprint.

Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces

A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as 'bad' may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria. Further, the plurality of calibration sites that are provided on the single calibration pad may be pre-evaluated so as to initially screen out unacceptable calibration sites prior to use. The techniques provided may be utilized in calibration processes which utilize a single calibration sample or processes which require a plurality of calibration samples.

Growing community of inventors

Austin, TX, United States of America

Dale A Harrison