Korea Institute of Science and Technology

Dal-Keun Park

Byung-Won Cho

Joong-Kee Lee

Bup-Ju Jeon

Joo-Man Woo

A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an organic material supply system for providing organic material of gas or liquid phase; and a DC bias system for inducing the metal ion and the radical ion on a substrate is provided, and a method for fabricating metal composite film comprising: a step of providing a process chamber with the gas as plasma form using the ECR; a step of providing the chamber with the metal ion and the organic material; a step of generating organic material ion and radical ion by reacting the metal ion and the organic material with the plasma; and a step of chemically compounding the organic material ion and the radical ion after inducing them on a surface of a specimen is also provided.

System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same

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Seoul, South Korea

Dal-Keun Park