Shofu Inc.

Fujitsu Corporation

Japan Science and Technology Corporation

Daisuke Takeuchi

Kenichi Goto

Jiro Matsuo

Isao Yamada

Mitsuji Teramae

Masataka Kase

Kazuki Yamamoto

Noriaki Toyoda

Norihiro Shimada

To provide An AlO-free dental lithium silicate glass composition comprising the following components: SiO: 60.0 to 80.0% by weight LiO: 10.0 to 17.0% by weight KO: 0.5 to 10.0% by weight a nucleating agent: 1.0 to 6.0% by weight a colorant: 0.0 to 10.0% by weight, and, a metal oxide Me(tetravalent)O: 5.0 to 10.0% by weight.

High strength lithium silicate glass ceramic having high shielding property

To provide a dental lithium silicate glass composition capable of providing a dental lithium silicate glass ceramic capable of efficiently precipitating the main crystals (lithium disilicate and/or lithium metasilicate) even after heat treatment. To provide a AlO-free dental lithium silicate glass composition including the following components: SiO: 60.0 to 80.0% by weight, LiO: 10.0 to 17.0% by weight, KO: 0.5 to 10.0% by weight, ZrO: 0.0 to 5.0% by weight, a nucleating agent: 1.0 to 6.0% by weight, a glass stabilizer: 0.0 to 8.0% by weight and a colorant: 0.0 to 10.0% by weight.

AlO-free lithium silicate glass composition

A method of manufacturing a semiconductor device comprising the steps of: ionizing decaborane; and implanting ionized decaborane into a silicon wafer. Solid decaborane can be vaporized in a reduced pressure atmosphere or by heating. A single decaborane molecule can provide 10 boron atoms while the acceleration energy per each boron atom can be reduced to about 1/10 of the acceleration energy for a decaborane molecule.

Boron doping by decaborane

Growing community of inventors

Kyoto, Japan

Daisuke Takeuchi