Asahi Glass Company, Limited

Agc Inc.

Daisuke Taguchi

Takashi Sato

Shigeru Aida

Yoshiaki Higuchi

Wataru Kasai

Satoko Yasuda

Ken Iruya

Masakazu Ataku

Seigo Kotera

Yasuhiko Matsuoka

Kazuo Hamazaki

Satoshi Otsugu

To provide a copolymer capable of producing a molded article excellent in strength at a high temperature. A copolymer comprising ethylene units, tetrafluoroethylene units and other monomer units, wherein to the sum of ethylene units and tetrafluoroethylene units, the ethylene units are from 49 to 40 mol % and the tetrafluoroethylene units are from 51 to 60 mol %; to all units in the copolymer, other monomer units are from 2.6 to 6.0 mol %; the melting point is at least 230&#xb0; C.; and the melt flow rate is from 1 to 15 g/10 min.

Copolymer and composition containing same

To provide a resin film which comprises an ethylene/tetrafluoroethylene copolymer and which is to be used as, for example, a rubber plug lamination film to prevent breakage at the time of producing a laminated rubber plug. The resin film comprises an ethylene/tetrafluoroethylene copolymer and is characterized in that the product of the value of the endothermic peak height &#x394;H (mW/mg) obtained by its DSC-analysis and the haze (%) measured at a thickness of 100 &#x3bc;m, is from 0.1 to 0.2 (mW/mg&#xb7;%).

Resin film and process for its production

Provided is an effective process for producing a fluorinated polymer excellent in adhesion, by using a polymerization medium having a low ozone layer destruction potential. The process includes polymerizing a monomer mixture comprising a fluorinated monomer and a polar functional group containing monomer (excluding one having a fluorine atom) in a polymerization medium that contains a medium compound represented by CHF&#x2014;O&#x2014;CHF, m is an integer of from 1 to 6, n is an integer of from 1 to 6, x is from 0 to (2m+1), y is from 0 to 2n, and (x+y) is at least 1), and wherein a solution obtained by dissolving the polar functional group-containing monomer in the polymerization medium is continuously or intermittently added to a polymerization reaction system.

Process for producing fluorinated polymer

To provide a fluorinated elastomer composition which is excellent in flexibility, heat resistance and flame retardance, and a molded product, cross-linked product and covered electric wire, using such a fluorinated elastomer composition. A fluorinated elastomer composition comprising a tetrafluoroethylene/propylene copolymer (a), an ethylene/tetrafluoroethylene copolymer (b), an ethylene copolymer (c) containing epoxy groups and a flame retardant (d), wherein the mass ratio [(a)/(b)] of (a) to (b) is from 70/30 to 40/60, the mass ratio [(b)/(c)] of (b) to (c) is from 100/0.1 to 100/10, and the content of (d) is from 0.1 to 30 parts by mass per 100 parts by mass of the total content of (a), (b) and (c).

Fluorinated elastomer composition and method for its production, molded product, cross-linked product, and covered electric wire

To provide a fluorinated elastomer composition which is excellent in heat discoloration resistance and moldability, and a molded product, cross-linked product and covered electric wire, using such a fluorinated elastomer composition. A fluorinated elastomer composition comprising a fluorinated rubber (a) and a fluorinated copolymer (b), wherein the fluorinated copolymer (b) has units (A) derived from tetrafluoroethylene and units (B) derived from ethylene in a molar ratio [(A)/(B)] of the units (A) to the units (B) of from 25/75 to 80/20; the fluorinated copolymer (b) has a crystallization temperature of from 100 to 210&#xb0; C. and a melt flow rate of from 0.1 to 1,000 g/10 min.; and the mass ratio [(a)/(b)] of the fluorinated rubber (a) to the fluorinated copolymer (b) is from 80/20 to 20/80.

A mold release film, which is adapted to be disposed on the cavity surface of a mold to form a resin-encapsulated portion by encapsulating a semiconductor element of a semiconductor device with a curable encapsulation resin, has a tensile modulus of elasticity of from 10 to 24 MPa at 132&#xb0; C. as measured in accordance with JIS K 7127, and a peak peel resistance of at most 0.8 N/25 mm.

Mold release film and method of process for producing a semiconductor device using the same

To provide an optical member having an excellent transparency and heat resistance and further having favorable light resistance as compared with a molded product made of a conventional ethylene/tetrafluoroethylene copolymer, a process for producing the same, and an article provided with the optical member. An optical member made of a molded product containing a crosslinked product of an ethylene/tetrafluoroethylene copolymer comprising units (A) based on tetrafluoroethylene, units (B) based on ethylene and units (C) based on CH&#x2550;CH&#x2014;CF(wherein n is an integer of from 2 to 10), wherein the molar ratio ((A)/(B)) of the above units (A) to the above units (B) is from 50/50 to 66/34, and the molar ratio ((C)/{(A)+(B)}) of the above units (C) to the sum of the above units (A) and the above units (B) is from 4.0/100 to 10/100.

Optical member, process for producing same, and article provided with optical member

To provide an ethylene/tetrafluoroethylene copolymer which is excellent in heat resistance and flexibility. An ethylene/tetrafluoroethylene copolymer comprising repeating units (A) based on tetrafluoroethylene and repeating units (B) based on ethylene in a ratio of repeating units (A)/repeating units (B)=66/34 to 75/25 (molar ratio) and as an optional component, repeating units (C) based on a monomer represented by CH&#x2550;CX(CF)Y (wherein each of X and Y which are independent of each other is a hydrogen atom or a fluorine atom, and n is from 2 to 8) in an amount of from 0 to 1 mol % based on the total number of moles of the repeating units (A) based on tetrafluoroethylene and the repeating units (B) based on ethylene, and having a volume flow rate measured at 297&#xb0; C. of from 4 to 1,000 mm/sec and an elastic modulus of at most 500 MPa.

Ethylene/tetrafluoroethylene copolymer

It is an object of the present invention to provide a nonwoven fabric which is excellent in the heat resistance and the chemical resistance, of which the fiber diameter is small, which is excellent in the strength and of which the maximum pore diameter is small. A nonwoven fabric made of an ethylene/tetrafluoroethylene copolymer, characterized in that the nonwoven fabric is mutually fused continuous fibers of an ethylene/tetrafluoroethylene copolymer which has a melt viscosity of from higher than 100 to 1,500 Pa&#xb7;s at 240&#xb0; C.

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Chiyoda-ku, Japan

Daisuke Taguchi