Panasonic Intellectual Property Management Co., Ltd.

Daisuke Shindo

Takashi Hasegawa

Osamu Kusumoto

Tsutomu Kiyosawa

Atsushi Ohoka

Kouichi Saitou

Tsuneichiro Sano

Takayuki Wakayama

Osamu Ishiyama

A silicon carbide semiconductor device includes a first conductivity type silicon carbide substrate having an active region and a termination region surrounding the active region, a plurality of unit cells located in the active region, and a termination structure located in the termination region. Each unit cell is provided with a transistor structure. The termination structure includes the silicon carbide semiconductor layer, a second conductivity type second body region surrounding the active region, one or more second conductivity type rings surrounding the second body region, one or more outer-circumferential upper source electrodes surrounding the active region, and an upper gate electrode. The silicon carbide semiconductor device further includes a first protective film and a second protective film. The first protective film covers the inner-circumferential upper source electrode, the upper gate electrode, and an inner side surface of the one or more outer-circumferential upper source electrodes except for a pad region. The second protective film covers the first protective film and at least a part of the one or more second conductivity type rings.

Silicon carbide semiconductor device

Growing community of inventors

Toyama, Japan

Daisuke Shindo