Jsr Corporation

Asahi Kasei Chemicals Corporation

Nihon Parkerizing Co., Ltd.

Nomura Research Institute, Ltd.

Asahi Kasei Cehmicals Corporation

Asahi Kasei Kabushiki Kaisha

Daisuke Shimizu

Toshiyuki Kai

Tsutomu Shimokawa

Nobuji Matsumura

Ken Maruyama

Tomoki Nagai

Yoshifumi Araki

Hikaru Sugita

Yasuhiro Kusanose

Kenta Shibuya

Katsumi Suzuki

Masahiro Fujiwara

Takuya Suzuki

Takayuki Tsuji

Satoshi Otake

Kentarou Gotou

Masaaki Miyaji

Mika Horiuchi

Kosuke Nakatani

Yuzo Ishida

Kota Nishino

Kentarou Harada

Yuuji Yada

Fumihisa Miyajima

Eisuke Kudo

Yoshikazu Namai

Nobuo Suga

Provided are an AP node to which a plurality of sensors is connected; and a DB node connected to the AP node. The AP node includes: a receiving unit configured to receive measurement data including values of a plurality of measurement items output from each of the sensors; a queue that stores a most recent value in units of measurement items of each of the sensors; a determination unit configured to refer to the queue and then determine whether the value of each of the measurement items has changed, every time the measurement data is output from each of the sensors; a transmission unit configured to, in a case where there is a measurement item having a value change, generate storage data including the value of the measurement item for each of the measurement items and transmit the generated data to the DB node; and an overwriting unit configured to overwrite the most recent value in the queue with a newest value of the measurement item. The DB node includes: a plurality of tables that stores a value included in the measurement data for each of the measurement items of each of the sensors; and a storing unit configured to store the storage data transmitted from the AP node in a corresponding table.

Data management system

Provided is a surface treatment agent for a metal material with which it is possible to produce a surface-treated metal material that has excellent initial anti-rust properties without being coated with an anti-rust oil, excellent lubrication properties, and excellent anti-corrosion and adhesion properties in a coating film for which phosphate-based chemical conversion treatment, zirconium-based chemical conversion treatment, or other coating underlay processing is omitted. This surface treatment agent for a metal material contains: a zirconium compound; an aqueous epoxy resin having in the skeleton thereof a carboxyl-group-containing polymer that includes a repeated unit derived from a carboxyl-group-containing vinyl monomer, said aqueous epoxy resin also having an acid value of 5-50 mg KOH/g; and a hydroxycarboxylic acid.

Surface treatment agent for metal material and production method for surface-treated metal material

The present invention provides a method for producing a polymer by efficiently removing residue of metals such as titanium, aluminum and lithium from a polymer solution containing the residue of these metals to successfully obtain a purified polymer solution containing a smaller amount of the metal residue and having satisfactory color tone and transparency, a polymer solution and a polymer obtained by the production method.

Method for producing a polymer, polymer solution and polymer

A composition containing an oxide of titanium contains a conjugated dienic polymer and the oxide of titanium, wherein the content of the oxide of titanium is 0.10 to 75 ppm by mass in terms of titanium atom, and the average particle diameter of the oxide of titanium is 1.0 to 100 &#x3bc;m.

Composition containing oxide of titanium, polymer composition, and molded article

The present invention is related to a method for producing a polymer to efficiently remove metal residues of at least lithium and/or titanium from a polymer solution comprising the at least lithium and/or titanium to thereby obtain a refined polymer solution having little metal residue.

Method for producing polymer

The present invention provides a crosslinked foam having an excellent balance of various physical properties in terms of lightness, flexibility, permanent compression set, tear strength, impact resilience, and molding stability; a shoe midsole; and a crosslinkable and foamable composition that provides the crosslinked foam and shoe midsole. A crosslinkable and foamable composition comprising (A) an ethylene-based copolymer; (B) a copolymer comprising a vinyl aromatic monomer unit and an unsaturated bond-containing a conjugated diene monomer unit; (C) an organic peroxide; and (D) a foaming agent; a mass ratio of the component (A) to the component (B), (A/B), being from 97/3 to 50/50; and the component (B) comprising 5 mass % or more and 80 mass % or less of the vinyl aromatic monomer unit, and 5 mass % or more and 55 mass % or less of the conjugated diene monomer unit.

Crosslinkable and foamable composition, crosslinked foam, and shoe midsole comprising the same

A crosslinked composition is obtained by crosslinking a composition, containing: 1 to 99 parts by mass of a vinyl aromatic copolymer rubber (I) comprising 5 to 70% by mass of a vinyl aromatic monomer unit and 0.1 to 30% by mass of a conjugated diene monomer unit and having one or more tan &#x3b4; peak temperatures between 75&#xb0; C. and 125&#xb0; C.; 99 to 1 parts by mass of an ethylenic copolymer rubber (II); 10 to 100 parts by mass of an olefinic resin (III) based on 100 parts by mass of a total amount of the vinyl aromatic copolymer rubber (I) and the ethylenic copolymer rubber (II); and 0.01 to 50 parts by mass of a crosslinking agent (IV) based on 100 parts by mass of the total amount of the vinyl aromatic copolymer rubber (I) and the ethylenic copolymer rubber (II).

Crosslinked composition, method for producing crosslinked composition, and molded product

The disclosure provides a hydrogenated straight-chain block copolymer, obtained by selective hydrogenation of a straight-chain block copolymer.

Hydrogenated block copolymers and crosslinking compositions containing the same

A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1). 

Radiation-sensitive composition

A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). Rrepresents a hydrogen atom or a methyl group. Each Rindependently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q&#x2266;5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.

Radiation-sensitive resin composition and polymer

A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.

Pattern forming method

The present invention provides a thermoplastic elastomer composition obtained by dynamically crosslinking, under a melting condition, 100 parts by mass of a block copolymer (I), 1 to 1,000 parts by mass of a polar resin (II), 1 to 500 parts by mass of a modified polymer (III), and 0.01 to 50 parts by mass of a crosslinking agent (IV), wherein the block copolymer (I) comprises at least one polymer block (A) comprising as a main component an alkylene unit, and/or at least one copolymer block (B) comprising as main components an alkylene unit (b-1) and a vinyl aromatic monomer unit (b-2), and comprises at least one unsaturated block (C) comprising as a main component a conjugated diene monomer unit having 5 or more carbon atoms at an end.

Thermoplastic elastomer composition and method for producing the same

A compound shown by the following formula (1). 

Compound and radiation-sensitive composition

A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

Radiation-sensitive composition and process for producing low-molecular compound for use therein

A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner. 

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Tokyo, Japan

Daisuke Shimizu