Ntt Docomo, Inc.

Hitachi-High-Technologies Corporation

Hitachi High-Tech Corporation

Sony Corporation

Hitachi, Ltd.

Daisuke Satou

Tatehito Usui

Kenji Maeda

Satomi Inoue

Takeshi Ohmori

Kazunari Suzuki

Mamoru Kimura

Masahiro Hori

Jun Minakuti

Atsushi Ueda

Koutarou Nagase

Teppei Azuma

Ryouhei Kurita

Nobuhiro Kusuno

Nobuhiro Sawai

Daichi Kawamura

Mei Hasegawa

A plasma apparatus of processing a wafer disposed in a processing chamber using plasma includes one window, another window, a light receiving unit, a light source, and an optical branching unit which is disposed between the light source and the other window, branches light emitted by the light source to an optical path toward the processing chamber and an optical path in other direction, and reflects light in the processing chamber from the other window, and a detection unit which detects the light having been emitted from the plasma and received by the light receiving unit using one branched light and other branched and reflected light. The apparatus processes the wafer according to a condition for the processing which is adjusted based on a result of the detection.

Plasma processing apparatus and operation method thereof

A notification apparatus includes: an obtaining unit that obtains information on a use of a first mobile communication network when a mobile communication terminal configured to use selectively one of a first identifier and a second identifier which are assigned to the first mobile communication network and the second mobile communication network, respectively so as to perform a communication currently connects to the second mobile communication network using the second identifier; and a notifying unit that notifies the information obtained by the obtaining unit to the mobile communication terminal via the second mobile communication network.

Notification apparatus, notification system, notification method, and program

Growing community of inventors

Tokyo, Japan

Daisuke Satou