Japan Display Inc.

Hitachi Displays, Ltd.

Panasonic Liquid Crystal Display Co., Ltd.

Panasonic Liquid Crystal Co., Ltd.

Daisuke Mutou

Takao Nakamura

Kazuki Ishii

Hidenori Seki

Hiroyuki Abe

Takamitsu Kamada

Kazuo Takeda

Jun Gotoh

In a liquid crystal display device that uses a TFT, a contact hole is formed to connect an image signal line. An organic film is formed so as to cover the image signal line, and a common electrode, which is a transparent electrode, is formed on the organic film. An interlayer insulating film is formed on the common electrode. A through hole is formed in the interlayer insulating film, and the diameter of the through hole is greater than the diameter of the contact hole.

Liquid crystal display device

A liquid crystal display device capable of preventing the occurrence of crack in a capacitor insulating film due to laser marking is provided. The liquid crystal display device includes pixels arranged in a matrix in a display region above a substrate, a thin film layer formed in a non-display region excluding the display region, and a transparent insulating film extending from the display region to the non-display region and formed on the thin film layer, in which the transparent insulating film includes at least an organic insulating film formed of an organic compound for planarizing a surface of the substrate, an inorganic insulating film which is a thin film formed on the organic insulating film and formed of an inorganic compound and formed with an opening extending to the organic insulating film in a region above the thin film layer, and a transparent electrode layer which is formed in the opening of the inorganic insulating film to cover the organic insulating film exposed from the opening of the inorganic insulating film.

Display device

In a liquid crystal display device that uses a top gate TFT, a contact hole is formed to connect to an image signal line. An inorganic passivation film and an organic passivation film are formed in this order so as to cover the TFT, on which a common electrode is formed. Then, an interlayer insulating film is formed on the common electrode. A through hole for gas release is formed in the interlayer insulating film. The diameter of the through hole is greater than the diameter of the contact hole, so as to be able to easily release gas from the organic passivation film, and to prevent the interlayer insulating film from peeling off.

Liquid crystal display device having identification information

A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intensity is measured by a reflection light intensity monitor at the same points and at the same number of points on the substrate. From the value of 'A=1&#x2212;(R+T)' where R represents reflectivity and T is transmissivity, film thickness is measured and evaluated from the relation of the value A with film thickness. By this procedure, film thickness can be determined on 10,000 substrates or more per minute and film thickness of thin film can be measured over the entire substrate surface.

Method for measuring thickness of thin film, method for forming polycrystal semiconductor thin film, method for manufacturing semiconductor device, apparatus for manufacturing the same, and method for manufacturing image display device

Growing community of inventors

Mobara, Japan

Daisuke Mutou