Read Rite Corporation

Read-rite Smi Corporation

Shiseido Company, Limited

Osaka Organic Chemical Industry Ltd.

Daisuke Iitsuka

Kazuyuki Miyazawa

Takumi Watanabe

Masayuki Takagishi

Shin-ichi Akoh

Masayuki Hamakawa

Koichi Otani

Hideyuki Aoshima

Ryuji Kobo

A cosmetic is characterized by containing a polymer which is produced by polymerizing a fluorine atom-containing monomer represented by formula (I) (wherein Rrepresents a hydrogen atom or a methyl group; Rrepresents a hydrogen atom or a fluorine atom; m is an integer of 0 or 1 to 4; and n is an integer of 1 to 12), (B) a betaine monomer represented by formula (II) (wherein Rrepresents a hydrogen atom or a methyl group; Rand Rindependently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; p represents an integer of 1 to 4: and q represents an integer of 1 to 4) and (C) a monomer component containing an alkyl (meth)acrylate represented by formula (III) (wherein Rrepresents a hydrogen atom or a methyl group and Rrepresents an alkyl group having 8 to 22 carbon atoms) with one another.

Cosmetic

An inverse type compound thin film magnetic with good dispersion of the heat generated in the magnetoresistance (MR) element, ensuring thermal reliability. In one embodiment, an electromagnetic induction type thin film magnetic head, a magnetoresistance effect type thin film magnetic head, a first protective film, a heat dispersion layer with thermal conductivity higher than the first protective film, and a second protective film are formed in succession on a substrate.

Compound thin film magnetic head

An apparatus and method for formation of the upper magnetic pole layer of a thin film magnetic head. The presently described method for formation of the upper magnetic pole layer of a thin film magnetic head enables the formation with submicron precision of a resist layer for use in forming the upper magnetic pole layer, which must necessarily be formed on a surface having a step, which can contribute to further improvement of areal recording densities. A frame for use in forming the upper magnetic pole layer is formed from multiple resist layers, and the relatively thick lower resist layer is formed by a vacuum thin film formation method.

METHOD FOR FORMATION OF UPPER MAGNETIC POLE LAYER OF THIN FILM MAGNETIC HEAD, METHOD OF FORMING MINIATURE BLOCK PATTERN WITH HIGH ASPECT RATIO ON BOTTOM PART OF STEP ON SURFACE WITH STEP, AND THIN FILM MAGNETIC HEAD

A composite type thin-film magnetic head. In one embodiment, a projection is formed on a second magnetic film layer of a composite type thin-film magnetic head. The position where this projection is formed is the area where a second magnetic film layer and third magnetic film layer face each other across a gap film layer. A width b of the projection is smaller than a width a of the third magnetic layer film.

Composite type thin-film magnetic head

A method of manufacturing a thin film magnetic head. In one embodiment, a lower magnetic pole and a magnetic film are formed on a substrate that is covered by an insulating film. A mask is then formed on the lower magnetic pole. The mask and the lower magnetic pole are then ion milled to the same width. A protective film is then formed to sufficiently cover then lower magnetic pole and the mask. The protective film is then polished to expose the mask. An exposed surface of the mask and the protective film are then planarized and the remaining make is then removed by wet etching. A concavity is formed at a position in the lower magnetic pole in the protective film. An upper magnetic pole is then formed by electroplating on the concavity. The mask is formed by electroplating Cu or permalloy, or by patterning photoresist.

Growing community of inventors

Osaka, Japan

Daisuke Iitsuka