Horiba Stec, Co., Ltd.

Horiba, Ltd.

Daisuke Hayashi

Masakazu Minami

Yuhei Sakaguchi

Kotaro Takijiri

Katsumi Nishimura

Toru Shimizu

Masaki Inoue

Atsuko Teraoka

Miyako Hada

The present invention is a wafer temperature control device for controlling the temperature of a wafer by regulating the pressure of a heat transfer gas, the wafer temperature control device being capable of estimating the temperature of the wafer with sufficient accuracy and controlling the temperature of the wafer to a target temperature, and including: a pressure regulator configured to regulate the pressure of the heat transfer gas; a nearby temperature sensor configured to measure a nearby temperature of the wafer, a temperature estimation observer configured to estimate the temperature of the wafer based on the nearby temperature measured by the nearby temperature sensor and a manipulated pressure variable input to the pressure regulator or the pressure regulated by the pressure regulator, and a controller configured to control the manipulated pressure variable based on a temperature setting and an estimated wafer temperature estimated by the temperature estimation observer.

Wafer temperature control device, wafer temperature control method, and wafer temperature control program

In order to provide an absorption analyzer capable of directly measuring an analysis target gas flowing into or produced in a vessel such as a chamber and preventing a measurement error due to moisture condensation, the absorption analyzer is adapted to include: a light emission module that is attached covering a first opening of the vessel into which the analysis target gas flows or in which the analysis target gas is produced and emits light into the vessel; and a light detection module that detects the light emitted from the light emission module and passing through the vessel. In addition, the light emission module is adapted to include: a base flange that is attached around the first opening on an outer surface of the vessel; a window material whose outer surface is tilted at a predetermined angle; a seal member; and a pressing body.

Absorption analyzer

The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system

The present invention intends to provide a CpMg concentration measuring device capable of accurately measuring the concentration of CpMg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 &#x3bc;m and on the basis of the light intensity, calculate the concentration of CpMg in a material gas.

[object Object]

A spectrophotometer is provided, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function &#x3b1; for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function &#x3b2; for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value.

Spectrophotometer and method for calibrating the same

A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

Growing community of inventors

Kyoto, Japan

Daisuke Hayashi