Nikon Corporation

The University of Tokyo

Daishi Tanaka

Leonard Wai Fung Kho

Alex Ka Tim Poon

Derek Coon

Gaurav Keswani

Kuno Suzuki

Takanori Ichiki

Yasushi Tanabe

Makoto Ishida

Kazuya Ota

Mariko Hirokawa

Hisao Osawa

Jiro Inoue

Mariko Mukai

An image processing method, including: by a processor: acquiring a fundus image; performing a first enhancement processing on an image of at least a central region of the fundus image, and performing a second enhancement processing, which is different from the first enhancement processing, on an image of at least a peripheral region of the fundus image that is at a periphery of the central region; and generating an enhanced image of the fundus image on the basis of a first image obtained as a result of the first enhancement processing having been performed and a second image obtained as a result of the second enhancement processing having been performed.

Image processing method, image processing device, and program

An image processing method includes acquiring a three-dimensional image of a subject eye and a two-dimensional image of the subject eye, specifying a first reference point in the three-dimensional image, specifying a second reference point in the two-dimensional image, and generating a superposed image. In the superposed image, the first reference point in the three-dimensional image is coordinated with the second reference point in the two-dimensional image and the two-dimensional image is superposed with at least a portion of the three-dimensional image.

Image processing method, image processing device and program memory medium

A microparticle detection system includes a stage unit including a mounting surface on which a fluid device having a flow path through which a sample containing microparticles is movable is capable of being mounted, an emission unit configured to emit illumination light to the flow path, an imaging unit configured to image scattered light generated from microparticles in the sample when illumination light is emitted, an identification unit configured to identify the microparticles included in the image for each of the microparticles on the basis of the image captured by the imaging unit, a particle size determination unit configured to determine a particle size of the microparticle for each of the microparticles identified by the identification unit, a zeta potential determination unit configured to determine a zeta potential of the microparticle for each of the microparticles identified by the identification unit, and a correlation unit configured to associate the particle size for each of the microparticles determined by the particle size determination unit with the zeta potential for each of the microparticles determined by the zeta potential determination unit for each of the microparticles.

Microparticle detection system and microparticle detection program

A particle detection method in which particles in a sample are detected includes: a mounting step of mounting, on a stage portion, a fluid device including a channel through which the particles can move; an irradiation step of irradiating the channel with illumination light; and a detection step of detecting scattered light generated from the particles by irradiation with the illumination light. In the irradiation step, the illumination light is converged such as to enter the channel by passing through, among side surfaces of the channel, only the first side surface that faces an illumination light incident direction.

Particle detection method, particle detection device and particle detection system

A particle analysis apparatus includes: an acquisition unit that acquires a plurality of images each captured at a different time in each of which a particle moving in a predetermined direction in a medium is imaged; and a determination unit that determines, based on a movement amount of a particle due to Brownian motion in the medium, whether or not an image of a first particle included in an image captured at a first time of the plurality of images acquired by the acquisition unit and an image of a second particle included in an image captured at a second time which is different from the first time of the plurality of images acquired by the acquisition unit are images indicating the same particle.

Particle analysis apparatus, observation apparatus, particle analysis program and particle analysis method

A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.

Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

An immersion lithography apparatus that includes a substrate holder on which a substrate is held, a projection system having a final optical element and that projects an exposure beam onto the substrate through an immersion liquid, and a liquid confinement member having an aperture through which the exposure beam is projected, a lower surface including a non-fluid removal area surrounding the aperture, and a liquid recovery outlet from which the immersion liquid is recovered, also includes a movable member. The movable member is movable relative to the liquid confinement member in a substantially horizontal direction, and has an opening through which the exposure beam is projected. The movable member has upper and lower surfaces that surround the opening, and is movable while a portion of the upper surface faces the non-fluid removal area in the lower surface of the liquid confinement member.

Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate

A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.

An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.

Growing community of inventors

Kounosu, Japan

Daishi Tanaka