Ushio Denki Kabushiki Kaisha

Daiki Yamatani

Yusuke Teramoto

Hiroto Sato

Akihisa Nagano

Kazunori Bessho

Disclosed herein a high temperature plasma raw material supply apparatus capable of appropriately supplying high temperature plasma raw materials in which impurities are suppressed to a reservoir reserving high temperature plasma raw material in a liquid state. A tin filling mechanism includes a raw material reservoir unit rotatably arranged and configured to reserve a plurality of high temperature plasma raw materials in a solid state; a supply nozzle configured to supply the high temperature plasma raw materials to an outside of the raw material reservoir unit; a load lock unit provided between a housing and a chamber; and a supply path unit configured to guide the high temperature plasma raw materials supplied from the supply nozzle to the load lock unit. At least a part of the supply path unit is provided with a hole formed smaller than the high temperature plasma raw material in the solid state.

High-temperature plasma raw material supply apparatus and extreme ultra violet light source apparatus

An extreme ultraviolet light source device, comprising a collector mirror focusing extreme ultraviolet radiation at a focal point, wherein a porous plate having a plurality of through holes arranged such that only radiation focusing at said focal point passes is provided insertably between said collector mirror and said focal point on an optical axis of said collector mirror, and a detection means is provided to receive radiation having passed through said porous plate and to detect an intensity of said received radiation, and a method for detecting an irradiance distribution in an extreme ultraviolet light source device.

Method for the detection of the irradiance distribution in an extreme ultraviolet light source device and an extreme ultraviolet light source device

In an extreme ultraviolet ('EUV') light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.

Extreme ultraviolet light source and positioning method of light focusing optical means

To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.

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Tokyo, Japan

Daiki Yamatani