Nitto-Denko Corporation

Panasonic Intellectual Property Management Co., Ltd.

Panasonic Corporation

Osaka University

Takasago International Corporation

Daiki Kato

Masahiro Nakamura

Tomotake Nashiki

Masahito Yamana

Takahiro Koyanagi

Nozomi Fujino

Takeyuki Yamaki

Hironobu Machinaga

Eri Ueda

Rie Kawakami

Yoshimasa Matsushima

Kazuhiko Matsumura

Kazuaki Sasa

Mitsuo Yaguchi

Kazushi Mashima

Toshihiro Higuchi

Tomoya Matsuda

Tsukasa Miyazaki

Shusei Soma

Kazuaki Sassa

Haruki Nagae

Shinya Akebi

Takahiro Hirai

Shoko Akiyama

A method for converting an N,N-dialkylamide compound into an ester compound includes using a fourth period transition metal complex as a catalyst. The fourth period transition metal complex is obtained by a reaction of a precursor having a fourth period transition metal with a nitrogen-containing compound or a phosphorus-containing compound.

Method for converting N,N-dialkylamide compound into ester compound using complex of fourth-period transition metal as catalyst

There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13&#xd7;10atoms/cmor less; and the transparent conductive layer has a specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 2.8&#xd7;10&#x3a9;&#xb7;cm or less.

Transparent conductive film and method for producing the same

A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference &#x394;E between a pattern portion and a non-pattern portion is 7.0 or less.

Transparent conductive film

A transparent conductive filmincludes, in this order, a transparent substrate, a first optical adjustment layer, an inorganic layer, and a transparent conductive layer. The first optical adjustment layerhas refractive index nC lower than refractive index nA of the transparent substrate, and thickness TC of 10 nm or more and 35 nm or less. The inorganic layerhas refractive index nD that is lower than the absolute value |nC&#xd7;1.13| of a value obtained by multiplying the refractive index nC of the first optical adjustment layerby 1.13.

A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Transparent electroconductive film with protective film

There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiOfilm from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cmor more and 2.8 g/cmor less. The transparent conductive layer has specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 3.8&#xd7;10&#x3a9;&#xb7;cm or less.

A transparent conductive filmincludes a transparent substrate; a first optical adjustment layerdisposed on one side in the thickness direction of the transparent substrateand made of a resin layer; an inorganic substance layerdisposed on one side in the thickness direction of the first optical adjustment layerso as to make contact with the first optical adjustment layer; and a transparent conductive layerdisposed on one side in the thickness direction of the inorganic substance layer. The inorganic substance layerhas a thickness of 10 nm or less, and the surface of the one side in the thickness direction of the transparent conductive layerhas a surface roughness of 1.40 nm or less.

An organic EL device includes: a first substrate having electrical conductivity; an organic layer formed on the first substrate; a second substrate having translucency; and an electrode layer formed on the second substrate. The electrode layer on the first substrate and the organic layer on the second substrate contact each other. The organic layer is not formed in the peripheral portion of the second substrate. In the region where the organic layer is not formed, a portion of the electrode layer is provided to extend, and the first substrate is not present to face the extended electrode layer, and the portion of the electrode layer is exposed to form an electrode portion. Thus, the electrode portion can be formed by a simple procedure in which, for example, the first substrate is removed, and the organic EL device can be efficiently manufactured.

Organic EL device and method of manufacturing organic EL device

A luminescent element includes a first electrode layer, a functional layer including an emitting layer and being disposed on the first electrode layer, a conductive layer permitting transmission of light and being disposed on the functional layer, and a first patterned electrode and a second patterned electrode each having an opening and being disposed on the conductive layer to be separated from each other. The conductive layer extends from a first area in which the first patterned electrode is disposed on the conductive layer to a second area in which the second patterned electrode is disposed on the conductive layer.

Luminescent element and lighting device using the same

An organic EL device includes a metal layer which is provided with a nano-order-sized unevenness on one surface and plural organic layers which include a light emitting layer provided on the one surface side of the metal layer, and a height of each unevenness at respective interfaces in the organic layer is made smaller than an unevenness provided on the metal layer. According to the above configuration, the unevenness on one surface of the metal layer changes a surface plasmon to a propagation light and a light loss can be suppressed, and moreover, each unevenness of respective interfaces of the respective organic layers is made smaller than the unevenness on the surface of the metal layer, so that a short circuit inside the device can be suppressed.

Organic electroluminescence device

An organic EL device includes a first substrate including a cathode layer (a first electrode layer), an organic layer formed on the cathode layer, an anode layer (a second electrode layer) formed on the organic layer, and a second substrate joined to the anode layer by an adhesive layer. The anode layer is provided so as to extend to an outer peripheral side of a region where the organic layer is present, the second substrate and the adhesive layer are not present in a portion which faces a region at an outer peripheral side of the extended anode layer, and the cathode layer and the extended anode layer are exposed from the second substrate to constitute a cathode taking-out portion and an anode taking-out portion, respectively.

Organic EL device

An organic EL device includes a first substrate including a cathode layer and a smoothing layer, an organic layer formed on the cathode layer, an anode layer formed on the organic layer, and a second substrate joined to the anode layer. In a region of a peripheral portion of the first substrate, the organic layer is not formed. The anode layer is provided on the cathode layer through an insulating layer in a portion of the region so as to extend to an outer peripheral side, the extended anode layer is folded back to a side opposite to the second substrate to constitute an anode taking-out portion, and a portion of the cathode layer of the first substrate is folded back to constitute a cathode taking-out portion.

An organic EL device includes a first substrate having electrical conductivity, an organic layer formed on the first substrate, an electrode layer formed on the organic layer, and a second substrate joined to the electrode layer by an adhesive layer. In a region of a peripheral portion of the first substrate, the organic layer is not formed, and a portion of the electrode layer is provided on the first substrate through an insulating layer so as to extend to an outer peripheral side of a region where the organic layer is present. The extended electrode layer is folded back together with the insulating layer to a side opposite to the second substrate, to constitute an electrode taking-out portion.

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Osaka, Japan

Daiki Kato