Shin-etsu Chemical Co., Ltd.

Shin-etsu Chemical C O., Ltd.

Daijitsu Harada

Masaki Takeuchi

Harunobu Matsui

Hiroyuki Yamazaki

Atsushi Watabe

Tohru Kubota

Ayumu Kiyomori

Takayuki Honma

Yukio Shibano

Daiyu Okafuji

Yoko Ishitsuka

Hisashi Yagi

Mamoru Morikawa

Shuhei Ueda

Kazuo Shirota

Naoki Yarita

Ryouhei Hasegawa

Kazuhiko Aoki

A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing AlO, a second layer containing HfO, and a third layer containing MgFor SiOsequentially laminated on the main surface of the synthetic quartz glass substrate.

Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation device

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nmor less at a spatial frequency of 0.1 μmor more and 20 μmor less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.

Mask blank glass substrate

A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nmor less at a spatial frequency of 0.1 &#x3bc;mor more and 20 &#x3bc;mor less, the maximum value being obtained by measuring a surface morphology of a region of 10 &#x3bc;m&#xd7;10 &#x3bc;m with an atomic force microscope.

A synthetic quartz glass cavity member () is bonded to a substrate () having an optical device () mounted thereon such that the device may be accommodated in the cavity member. The cavity member () has an inside surface consisting of a top surface () opposed to the device () and a side surface (). The top surface () is a mirror surface and the side surface () is a rough surface.

Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methods

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 &#x3bc;m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method

A circular mold-forming substrate of 125-300 mm diameter having a surface on which a topological pattern is to be formed is provided wherein the thickness of the substrate has a variation of up to 2 &#x3bc;m within a circle having a diameter of 125 mm.

Mold-forming substrate and inspection method

A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate () and a metal or metal compound film (), and forming a metal base adhesive layer () on the metal or metal compound film (). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In.

Synthetic quartz glass lid precursor, synthetic quartz glass lid, and preparation methods thereof

A rectangular glass substrate has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 &#x3bc;m below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface along the edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one side surface to a position of 50 &#x3bc;m below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.

Rectangular glass substrate and method for preparing the same

A synthetic quartz glass lid is provided comprising a synthetic quartz glass and an adhesive formed on a periphery of a main surface of the window member. Further, an optical device package is provided comprising a box-shaped receptacle having an open upper end, an optical device received in the receptacle, and a window member of synthetic quartz glass bonded to the upper end of the receptacle with an adhesive. The adhesive is a low-melting metallic glass consisting of Te, Ag and at least one element selected from W, V, P, Ba, and Zr.

Synthetic quartz glass lid and optical device package

Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.

Method for preparing synthetic quartz glass substrate

A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating an arbitrary surface and an opposite surface of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring the birefringence of the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable or unacceptable group, based on the measured birefringence value.

A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.

A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface.

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Joetsu, Japan

Daijitsu Harada