Nippon Control System Corporation

Dai Tsunoda

Hiroyuki Tsunoe

Masahiro Shoji

Shuji Hada

Ayuko Sato

Nobuyasu Takahashi

Yasuaki Horima

In order to solve a problem of conventional mask information adjusting apparatuses in which the data size of mask information that can produce precise exposure patterns is large, an mask information adjusting apparatus includes: a subject information acquiring unit that acquires pre-adjustment mask information containing a polygonal mask pattern; a processing unit that acquires the degree of influence of removal of each vertex or side of the mask pattern, on an exposure pattern that is generated using a photomask corresponding to the mask pattern, in association with the vertex or point, and simplifies the mask pattern by removing each vertex or side according to whether or not a predetermined condition regarding the acquired degree of influence is satisfied; and an output unit that outputs post-adjustment mask information containing the mask pattern that has been simplified by the processing unit.

Mask information adjusting apparatus, mask data adjusting method, and program

A simulation apparatus includes: a factor amount converting information storage unit in which factor amount converting information, which is information indicating correspondence between low-fidelity information and high-fidelity information, is stored; a writing pattern information storage unit in which writing pattern information is stored; an ADI simulation unit that performs an ADI simulation using one or more evaluation points, for a writing pattern indicated by the writing pattern information, thereby acquiring one or more factor amounts; a converting unit that acquires high-fidelity information, which is one or more factor amounts, corresponding to the low-fidelity information, which is one or more factor amounts, using the factor amount converting information; and an etching simulation unit that performs an etching simulation using the one or more factor amounts acquired by the converting unit.

Simulation apparatus, simulation method, and storage medium

In order to solve the problem that information indicating three or more points on a contour of a figure drawn by an electron beam writer cannot be more precisely acquired, an information processing apparatus includes: an accepting unit that accepts pattern information indicating a pattern figure, and actually observed contour information acquired using an image obtained by capturing an image of a figure drawn by an electron beam writer; a transforming information acquiring unit that acquires transforming information, which is information that minimizes the sum of squares of differences between convolution values corresponding to three or more corrected contour points of a given point spread function in a region indicated by the pattern figure indicated by the pattern information and a threshold regarding the convolution values; a corrected contour point acquiring unit that acquires corrected contour point information, which is information indicating three or more corrected contour points respectively corresponding to three or more actually observed contour points, using the transforming information; and an output unit that outputs the corrected contour point information. Accordingly, it is possible to more precisely acquire information indicating three or more points on a contour of a figure drawn by an electron beam writer.

Information processing apparatus, information processing method, and storage medium

Stored energy is evaluated for each of segmented regions, and using the evaluated stored energy, an optimal irradiation amount for an electron beam is evaluated by a conjugate gradient method. The evaluated stored energy is used instead of calculating a determinant (Apk) in the procedure that includes calculation of the determinant (Apk) from among repeated calculation procedures that follow the conjugate gradient method and seek to answer a simultaneous linear equation (Ax=b) with a matrix (A) as a coefficient. Thus it is possible to evaluate the optimal irradiation amount for an electron beam with a high processing speed and a high degree of accuracy, and without expressly requiring the calculation of Apk, by managing the giant matrix (A) comprising numerous factors according to reduction of lines of circuitry in a circuit pattern.

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Kanagawa, Japan

Dai Tsunoda