Samsung Electronics Co., Ltd.

Dai-Hee Lee

Su-Hwan Kim

Sungmin Jang

A substrate treatment apparatus includes a substrate treatment unit configured to provide a chemical solution to a substrate to treat the substrate, and a chemical supply unit configured to supply the chemical solution to the substrate treatment unit. The chemical supply unit includes a loader configured to load a canister containing the chemical solution to the chemical supply unit, a clamp configured to clamp the canister in place, a chemical supply line through which the chemical solution is supplied to the substrate treatment unit, and a coupler configured to couple the chemical supply line to the canister. The chemical supply unit is capable of automatically replacing the canister and the substrate.

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Suwon-si, South Korea

Dai-Hee Lee