Boe Technology Group Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Daeyoung Choi

Yuliang Wang

Zengli Liu

Daojie Li

Jun Zhou

Liang Peng

Shikai Wang

Dongseob Kim

Jaeyun Jung

Jaemoon Chung

Dengtao Li

Jun Geng

Deyong Wang

Shijuan Chen

Fei Al

Yefa Li

Congqi Zheng

Shiwei Lv

The present disclosure provides a TFT, an array substrate, their manufacturing methods, and a display device. A source electrode and a drain electrode of the TFT are each of a multi-layered structure including a metal layer and a metal barrier layer. An a-Si active layer of the TFT is covered with an etch stop layer, via-holes penetrating through the etch stop layer are provided at positions corresponding to the source electrode and the drain, and the source electrode and the drain electrode are connected to the a-Si active layer through the via-holes.

Thin film transistor, array substrate, their manufacturing methods, and display device

Embodiments of the present invention disclose a target material thickness measuring apparatus including: a support; and a plurality of distance measuring units mounted on the support and arranged in a first direction, the plurality of distance measuring units being configured to respectively measure thicknesses of portions of a target material at a plurality of positions in the first direction. A plurality of thickness values of different portions of the target material along a straight line can be obtained at one time, for example, by performing a single measurement of thicknesses of the portions of the target material at the plurality of positions by means of the plurality of distance measuring units, thereby improving measurement efficiency.

Target material thickness measuring apparatus

The present invention provides an array substrate, a method for manufacturing the same and a display device, and relates to technical field of displays. The method for manufacturing an array substrate comprises forming a metal layer on a substrate and removing superficial metallic oxide on the metal layer by a washing process. The method for manufacturing an array substrate according to the present inversion can remove the superficial metal oxide on the metal layer and improve the performance of a TFT.

Array substrate, method for manufacturing the same and display device

A method for manufacturing an array substrate includes coating a photoresist onto an insulation layer including a gate insulation layer and an etch stop layer, wherein the gate insulation layer covers a conductive pattern and the etch stop layer covers a semiconductive pattern. The method further includes exposing the photoresist to form a photoresist partially-reserved region and a photoresist unreserved region. The method further includes performing a first etching process to at least partially remove a portion of the insulation layer located at a position corresponding to the photoresist unreserved region, to form an intermediate hole. The method further includes performing a second etching process to form the first via hole and form the second via hole at a position of the intermediate hole, thereby to reveal the semiconductive pattern and the conductive pattern at positions corresponding to the first via hole and the second via hole, respectively.

Array substrate, method for manufacturing the same, and display apparatus

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Beijing, China

Daeyoung Choi