Samsung Electronics Co., Ltd.

Daerim Choi

Junghwan Kim

Sunghyup Kim

Injae Lee

Jeonggil Kim

Yongchan Kim

HoSun Yoo

Dongkyeng Han

Ohkug Kwon

Ouiserg Kim

An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

Apparatus for generating extreme ultraviolet light and lithography apparatus including the same

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Hwaseong-si, South Korea

Daerim Choi