Samsung Electronics Co., Ltd.

Daehyun Jung

Sunggon Jung

Yujeong Sin

A method of inspecting a semiconductor device, includes: scanning a plurality of first circuit pattern layers of the semiconductor device and generating a plurality of first images respectively corresponding the plurality of first circuit pattern layers of the semiconductor device; overlapping the plurality of first images with each other and counting a plurality of first defects in the overlapped first images; setting main inspection areas with priority orders by using position coordinates of the counted first defects; and storing the main inspection areas with the position coordinates of the counted first defects.

Growing community of inventors

Suwon-si, South Korea

Daehyun Jung