Samsung Display Co., Ltd.

Hims Co., Ltd.

Daehoon Min

Tae Joon Kim

Chanhyeong Cho

Hyeonguk Yeo

Juil Kim

A photomask inspection apparatus includes a stage which supports an inspection substrate, a first optical system having a first numerical aperture and disposed at one side of the inspection substrate, a second optical system having a second numerical aperture, spaced apart from the first optical system, and disposed at the one side of the inspection substrate, an imaging optical system including a first objective lens aligned with the first optical system with the inspection substrate disposed therebetween, a second objective lens aligned with the second optical system with the inspection substrate disposed therebetween, and disposed at another side of the inspection substrate, which is opposite to the one side of the inspection substrate, and a camera which captures an image passed through the imaging optical system. The first numerical aperture is greater than the second numerical aperture.

Growing community of inventors

Incheon, South Korea

Daehoon Min