Up Chemical Co., Ltd.

Dae-Young Kim

Won Seok Han

Jun Hwan Choi

Wonyong Koh

Myeong-Ho Park

Jin Sik Kim

Sungwoo Ahn

Dong Hwan Ma

Myeong Ho Kim

In Jae Lee

The present disclosure relates to an aluminum compound, an aluminum-containing film-forming precursor composition including the aluminum compound, and a method of preparing an aluminum-containing film using the aluminum-containing film-forming precursor composition.

Aluminum precursor compound, production method therefor, and aluminum containing layer forming method using same

The present disclosure relates to a novel aluminum-containing compound, a method of preparing the aluminum-containing compound, a precursor composition for forming a film including the aluminum-containing precursor compound, and a method of forming an aluminum-containing film using the precursor composition for forming a film.

Aluminum compounds and methods of forming aluminum- containing film using the same

The present disclosure relates to a novel Group 5 metal compound, a method for preparing the Group 5 metal compound, a precursor composition for depositing a Group 5 metal-containing layer containing the Group 5 metal compound, and a method for depositing a Group 5 metal-containing layer using the precursor composition for depositing a Group 5 metal-containing layer.

Group 5 metal compound, method for preparing the same, precursor composition for depositing layer containing the same, and method for depositing layer using the same

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Pyeongtaek-si, South Korea

Dae-Young Kim