Nps Corporation

Dae Seok Song

Won Sik Nam

Kang Heum Yeon

Hyun Joon Park

The present disclosure relates to a substrate processing apparatus and a substrate processing method using the same, the substrate processing method including: introducing a substrate into a chamber; processing the substrate while heating the substrate by using a heat source unit provided in the chamber; and reciprocating at least any one of the substrate and the heat source unit in an extending direction of the substrate. Thus, while the substrate is processed, the temperature of the substrate may be uniformly adjusted, and the efficiency of thermal processing of the substrate may thereby be improved.

Method and apparatus for substrate processing

The present invention relates to a substrate processing apparatus, comprising, a chamber comprising a base frame formed to open at least a part of faces extending in vertical direction and horizontal direction, a main heat source provided in a row with isolation on an opened face of the base frame, and a block which is connected to the opened face of the base frame and forms a space in the base frame in which the substrate is processed; and a substrate support portion which is provided in the chamber and supports the substrate, and by integrating the chamber and the heat source, the size of the chamber itself is reduced, the space can be used efficiently with reduced installation space, and facilities cost can be saved.

Apparatus for processing substrate

The present invention relates to a substrate processing apparatus. The substrate processing apparatus includes a chamber including a chamber body of which one side is opened and having an inner space and a door opening and closing the chamber body, first susceptors disposed to be spaced apart from each other within the chamber, supports each of which is connected to one side surface of the door to support the substrate in parallel to the first susceptor, second susceptors disposed on the supports along a longitudinal direction of the door, the second susceptors being spaced apart from each other in a direction crossing the first susceptors, and at least one heat source unit disposed at least one surface of the chamber to heat the susceptors.

Growing community of inventors

Hwaseong-si, South Korea

Dae Seok Song