Korea Kumho Petrochemical Co., Ltd.

Dae Kyung Yoon

Jung Hoon Oh

Seung Duk Cho

Hyun Sang Joo

Dong Chul Seo

Dae Hyeon Shin

Yong Hwa Hong

Sung Jae Lee

Kyoung Jin Ryu

So Jeong Park

Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: 

Hydrophilic photoacid generator and resist composition comprising same

A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R, R, n, nand Ahave the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

Photoacid generator, method for producing the same, and resist composition comprising the same

A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: wherein X represents an electron-donating group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; Rand Reach represent an arylene group or a heteroarylene group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; and Aand Bare anions that are different from each other. The sulfonium compound, when used as a photo-acid generator, can produce a uniform and excellent resist pattern.

Sulfonium compound, photo-acid generator, and method for manufacturing the same

A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; Rand Reach independently represent an alkyl group or the like; Rto Reach independently represent an alkyl group, or the like; Rrepresents a cyclic alkenediyl group or the like; and &#x2212;A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.

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Chungcheongnam-do, South Korea

Dae Kyung Yoon