Samsung Electronics Co., Ltd.

Dae-il Kim

Dong-joon Ma

Yuri Nikolaevich Tolmachev

Sergiy Yakovlevich Navala

Jae Myung Jung

Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a substrate to be processed, a deposition material source that supplies a material to be deposited on the substrate into the process chamber, facing the substrate holder, a gas injection unit to inject a process gas into the process chamber, a bias power source that applies a bias potential to the substrate holder, a helical self-resonant coil that produces plasma for ionization of the deposition material in the process chamber, one end of the helical self-resonant coil being grounded and the other end being electrically open, and an RF generator to supply an RF power to the helical self-resonant coil. The use of a helical self-resonant coil enables the IPVD apparatus to ignite and operate at very low chamber pressure such as approximately 0.1 mtorr, and to produce high density plasma with high efficiency compared to a conventional IPVD apparatus. Accordingly, a high efficiency of ionization of deposition material is achieved.

Ionized physical vapor deposition apparatus using helical self-resonant coil

A high-density plasma processing apparatus includes a processing chamber, having a susceptor for supporting an object to be processed positioned therein and a dielectric window positioned on the processing chamber to form an upper surface of the processing chamber. A reaction gas injection device injects a reaction gas into an interior of the processing chamber. An inductively coupled plasma (ICP) antenna, which is installed on a center of the dielectric window, transfers radio frequency (RF) power from an RF power supply to the interior of the processing chamber. A waveguide guides a microwave generated by a microwave generator. A circular radiative tube, which is installed on the dielectric window around the ICP antenna and is connected to the waveguide, radiates a microwave toward the interior of the processing chamber via a plurality of slots formed through a bottom wall of the radiative tube.

High-density plasma processing apparatus

A method and apparatus for preventing an adjacent track erase effect due to a magnetic head. In the method, a write command is received, an ambient temperature of a hard disc drive is measured, and whether the ambient temperature exceeds a threshold temperature is determined. If the ambient temperature exceeds the threshold temperature, the intensity of a write current is adjusted according to the position of a magnetic head on the hard disc drive. If an overshooting value of the write current exceeds a predetermined steady-state value, the overshooting value of the write current is adjusted. Applying the write current having the intensity and the overshooting value adjusted to the magnetic head. An algorithm having writing intervals can also be used in a hard disc drive. Thus, a writing field can be minimized and made suitable for variations in the temperature of the hard disc drive and coercivity of a magnetic disc so that an adjacent track erase effect can be reduced. Also, since a thermal pole tip protrusion effect due to a several-times-repeated writing operations can be prevented, a margin of a bit error rate of a magnetic head/magnetic disc can be increased and defects occurring on the magnetic head and the magnetic disc can be minimized.

Growing community of inventors

Gyeonggi-do, South Korea

Dae-il Kim