Korea Institute of Machinery & Materials

Korea Advanced Institute of Science and Technology

Dae-Geun Choi

Ji-Hye Lee

Ji Hye Lee

Jun-ho Jeong

Ki-Don Kim

Eung-Sug Lee

Jun-Hyuk Choi

So-Hee Jeon

Jang-Joo Kim

Jong-Youp Shim

Jae-R Youn

Chang-Soo Han

Young-Suk Sim

Jin-Won Song

Seung-Man Yang

Soon-Hyoung Hwang

Seong-Je Park

June-Ki Park

Joo-Yun Jung

Se Gyu Jang

Sa-Rah Kim

Hyeong-Ho Park

Ji-Eun Kim

Hee-Won Seo

Jong-Hong Lee

Sang Keun Sung

Jun-Ho Jeong

An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.

Organic light emitting device and manufacturing method thereof

A method for separating carbon nanotubes is disclosed where nanotubes with specific properties are separated from a mixture of nanotube products, which contains various types of nanotubes and impurities.

Method for separating nanotubes using microwave radiation

A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.

Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode

The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.

Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same

A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer.

Method of fabricating patterned polymer film with nanometer scale

Growing community of inventors

Daejeon, South Korea

Dae-Geun Choi