Lg Chem, Ltd

Dae Chul Jung

Tae Moon Park

Dong Hoon Lee

Sung Kyu Lee

Hyun Jun Lee

Joon Ho Shin

Sang Beom Lee

Sung Ho Lee

Ju Young Kim

Woo Ram Lee

Jeong Seok Kim

Si Nae Lee

Yong Hee Jang

Hyun Jik Yi

By using the distillation device of the present application, energy loss occurring in a purification process of a solution including a waste stripper and a stripped photoresist resin used in a stripping process of a photoresist can be minimized and the installation cost of the distillation device can be reduced compared to the case in which dual distillation columns are used, thereby increasing the economic feasibility of a process.

Distillation method

The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.

Stripper composition for removing photoresists and method for stripping photoresists using the same

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Daejeon, South Korea

Dae Chul Jung