Asml Netherlands B.v.

Daan Daniel Johannes Antonius Van Sommeren

Giovanni Luca Gattobigio

Yuri Johannes Gabriël Van De Vijver

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Harold Sebastiaan Buddenberg

Erik Henricus Egidius Catharina Eummelen

Theodorus Wilhelmus Polet

Siegfried Alexander Tromp

Ferdy Migchelbrink

Gheorghe Tanasa

Jimmy Matheus Wilhelmus Van De Winkel

Arnoldus Johannes Martinus Jozeph Ras

Jorge Alberto Vieyra Salas

Mark Johannes Hermanus Frencken

Miao Yu

Aleksandar Nikolov Zdravkov

Bert Dirk Scholten

Jeroen Arnoldus Leonardus Johannes Raaymakers

Floor Lodewijk Keukens

Walter Theodorus Matheus Stals

Marijn Wouters

Petrus Martinus Gerardus Johannes Arts

Seerwan Saeed

Josephus Peter Van Lieshout

Frank Johannes Jacobus Van Boxtel

Thomas Poiesz

Christianus Wilhelmus Johannes Berendsen

Martinus Van Duijnhoven

Johannes Cornelis Paulus Melman

Gijsbert Rispens

Bart Dinand Paarhuis

Johan Franciscus Maria Beckers

Francis Fahrni

Güneş Nakiboglu

Anne Willemijn Bertine Quist

Theodorus Johannes Antonius Renckens

Maarten Holtrust

Güneş Nak{dot Over (i)}boğlu

Johannes Cornelius Paulus Melman

Bruno Jean François Frackowiak

Arend Koolma

A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

Lithographic apparatus

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Substrate holder, a lithographic apparatus and method of manufacturing devices

A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

Method for removing photosensitive material on a substrate

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

A fluid handling structure, an immersion lithographic apparatus and a device manufacturing method are disclosed. In one arrangement, a fluid handling structure has a fluid extraction conduit with a recovery port configured to receive a used fluid into the conduit. A plurality of flow breakers are provided that each extends across at least a portion of the conduit. The flow breakers are positioned downstream of the recovery port. The flow breakers are arranged so that a common plane cuts through at least a portion of two or more of the flow breakers. The common plane is aligned so as to be perpendicular to the average direction of flow in the conduit at the position of the common plane.

Fluid handling structure, immersion lithographic apparatus, and device manufacturing method

A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

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Beuningen, Netherlands

Daan Daniel Johannes Antonius Van Sommeren