Samsung Electronics Co., Ltd.

Da Il Eom

Sun Jung Lee

Jung Hun Choi

Young Tak Kim

Jae Hong Park

Jin Young Park

Minkyung Lee

Jun Ho Yoon

Keewon Kim

Sung Yeon Kim

Yong Moon Jang

Byeongtaek Bae

A semiconductor device and a manufacturing method thereof, the semiconductor device including an insulation layer; a metal resistance pattern on the insulation layer; a spacer on a side wall of the metal resistance pattern; and a gate contact spaced apart from the spacer, the gate contact extending into the insulation layer, wherein the insulation layer includes a projection projecting therefrom, the projection contacting the gate contact.

Method of manufacturing a semiconductor device

A method of measuring an image sensor is disclosed. The method includes connecting a measurement unit to an image sensor, producing an electric current, which sequentially flows through a second connection line, second lower electrodes, an upper electrode, first lower electrodes, and a first connection line of the image sensor, using the measurement unit, and measuring an alignment state of the lower electrodes, the photoelectric conversion layer, and the upper electrode.

Image sensor and methods of fabricating and measuring image sensor

A method for fabricating a semiconductor device includes forming an insulating layer on a substrate; forming a first mask pattern including silicon on the insulating layer and forming a second mask pattern including an oxide on the first mask pattern; forming a coating layer that includes carbon and which covers an upper surface of the insulating layer, a sidewall of the first mask pattern, and the second mask pattern; removing a portion of the coating layer and the second mask pattern; forming a metal layer on an upper surface of the first mask pattern and on a sidewall of the coating layer; exposing the upper surface of the insulating layer by removing the coating layer; and etching the insulating layer by using the first mask pattern and the metal layer as a mask.

Method for fabricating semiconductor device using a hybrid mask pattern

Semiconductor device and manufacturing method thereof

Growing community of inventors

Goyang-si, South Korea

Da Il Eom