International Business Machines Corporation

Cristina Camagong

Hariklia Deligianni

Roy Rongqing Yu

Emily R Kinser

Damon B Farmer

Yu Luo

Ying He

Andrei Fustochenko

A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.

Nanostructure featuring nano-topography with optimized electrical and biochemical properties

A method for forming a nanostructure includes coating an exposed surface of a base layer with a patterning layer. The method further includes forming a pattern in the patterning layer including nano-patterned non-random openings, such that a bottom portion of the non-random openings provides direct access to the exposed surface of the base layer. The method also includes depositing a material in the non-random openings in the patterning layer, such that the material contacts the exposed surface to produce repeating individually articulated nano-scale features. The method includes removing remaining portions of the patterning layer. The method further includes forming an encapsulation layer on exposed surfaces of the repeating individually articulated nanoscale features and the exposed surface of the base layer.

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Ridgefield, CT, United States of America

Cristina Camagong