Lumileds LLC

Asml Netherlands B.v.

Cristian Dan

Charles Schrama

Peter Josef Schmidt

Johannes Hendrikus Maria Spruit

Ruud Antonius Catharina Maria Beerens

Detlef Uwe Wiechert

Richard Henricus Adrianus Van Lieshout

A wavelength converting structure is disclosed, the wavelength converting structure including a spinel type SWIR phosphor material having emission wavelengths in the range of 1000 to 1700 nm, the SWIR phosphor material including AEADEO:Ni,Crwhere AE=Mg, Zn, Co, or Be, or mixtures thereof, A=Li, Na, Cu, or Ag, or mixtures thereof, D=Ga, Al, B, In, or Sc, or mixtures thereof, and E=Si, Ge, Sn, Ti, Zr, or Hf, or mixtures thereof; where 0≤x≤1, 0<y≤0.1, 0≤z≤1, 0≤u≤0.2.

Swir pcLED and spinel type phosphors emitting in the 1000-1700 nm range

A distance measurement system includes two or more line pattern generators (LPGs), a camera, and a processor. Each LPG emits a line pattern having a first set of dark portions separated by a respective first set of bright portions. A first line pattern has a first angular distance between adjacent bright portions, and a second line pattern has a second angular distance between adjacent bright portions. The camera captures at least one image of the first line pattern and the second line pattern. The camera is a first distance from the first LPG and a second distance from the second LPG. The processor identifies a target object illuminated by the first and second line patterns and determines a distance to the target object based on the appearance of the target object as illuminated by the first and second line patterns.

Depth sensing using line pattern generators

Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.

Lithographic apparatus with a deformation sensor

Growing community of inventors

Eindhoven, Netherlands

Cristian Dan