Rtx Corporation

United Technologies Corporation

Cristal Chan

Olivier H Sudre

Nitin Garg

John H Shaw

Ying She

Kathryn S Read

Tania Bhatia Kashyap

Mary Colby

Asa Frye

Daniel L Becerra

Ben Callaway

A ceramic matrix composite includes a plurality of ceramic fibers and an interface coating disposed on the plurality of ceramic fibers. The interface coating includes a carbon-based layer disposed on each ceramic fiber of the plurality of ceramic fibers and a boron-nitride based layer disposed on the first carbon-based layer. The ceramic matrix composite also includes a ceramic matrix surrounding the plurality of ceramic fibers. A ceramic matrix composite and a method of forming a ceramic matrix composite component are also disclosed.

Ceramic component

A ceramic matrix composite includes a ceramic matrix, fibers embedded in the ceramic matrix, and an interfacial coating system on each of the fibers. The interfacial coating system includes alternating layers of boron nitride layers of individual thicknesses of about 50 nanometers to 200 nanometers and carbon layers of individual thicknesses of less than 5 nanometers.

Ceramic matrix composite with interfacial coating system

A fibrous ceramic preform includes a plurality of ceramic fibers, a first amorphous layer, and an interfacial coating layer. The interfacial coating layer includes an anisotropic region adjacent the at least one amorphous layer, and an isotropic region on a side of the anisotropic region opposite the at least one amorphous layer.

Method to form aligned interface coating on silicon carbide fibers

A chemical vapor infiltration and deposition (CVI/CVD) reactor assembly includes a CVI/CVD reactor and a reactant gas feed source. The CVI/CVD reactor includes a first inlet at a first end of the CVI/CVD reactor, a second inlet at a second end of the CVI/CVD reactor opposite the first end, a first outlet at the second end, a second outlet at the first end, and a chamber in fluid communication with the first and second inlets and first and second outlets and configured to hold a substrate. The reactant gas feed source is interchangeably and fluidly connected to the first and second inlets by first and second valved gas lines, respectively.

CVI/CVD matrix densification process and apparatus

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East Hampton, CT, United States of America

Cristal Chan