Dupont Photomasks, Inc.

Craig A West

Joseph Stephen Gordon

Gregory P Hughes

Glenn Edward Storm

James A Carroll, Iii

Kent B Ibsen

Susan S MacDonald

A method for constructing a photomask assembly using an encoded mark is disclosed. The method includes comparing a first encoded mark located on a photomask with a second encoded mark located on a pellicle. The first encoded mark includes one or more first symbols and the second encoded mark includes one or more second symbols. The method further includes mounting the pellicle on the photomask if at least one of the symbols of the first encoded mark matches at least one of the symbols of the second encoded mark.

Method for constructing a photomask assembly using an encoded mark

A method and apparatus for calibrating a metrology tool are disclosed. The method includes measuring a parameter of a contrast enhanced feature on an artifact using a metrology tool, where the contrast enhanced feature reduces random errors in the metrology tool during the measuring process. The measured parameter is compared with an initial parameter associated with the artifact and the metrology tool is adjusted until the measured parameter matches the initial parameter.

Method and apparatus for calibrating a metrology tool

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Austin, TX, United States of America

Craig A West