Infineon Technologies Ag

Qimonda Ag

Adesto Technologies Corporation

Altis Semiconductor, Snc

Corvin Liaw

Heinz Hoenigschmid

Josef Willer

Michael Angerbauer

Milena Dimitrova

Thomas Mikolajick

Hans Reisinger

Thomas Roehr

Michael Kund

Gerhard Mueller

Rainer Bruchhaus

Ralf Symanczyk

Peter Schroegmeier

Karl-Heinz Küsters

A method for operating a resistivity changing memory including applying a programming voltage to a resistivity changing memory cell to define a programmed state and applying a refresh voltage to the resistivity changing memory cell for maintaining the programmed state of the resistivity changing memory cell. In one embodiment, the refresh voltage is less than the programming voltage.

Method for operating an integrated circuit having a resistivity changing memory cell

A method of determining the memory state of a resistive memory cell including a first electrode, a second electrode and an active material being arranged between the first electrode and the second electrode, comprises generating a read capacity by applying a voltage between the first electrode and the second electrode, discharging the read capacity over the active material of the memory cell, and determining the memory state of the memory cell in dependence on a change of the voltage during the discharge of the read capacity.

Method of determining a memory state of a resistive memory cell and device measuring the memory state of a resistive memory cell

An integrated circuit includes a plurality of resistivity changing memory cells and at least one resistivity changing reference cell; a voltage comparator including a first and second input terminals; a signal line connected to the memory cells, the reference cell, and the second input terminal; and a switching element connecting the first input terminal to the second input terminal. A method of operating the integrated circuit includes closing the switching element; supplying a first voltage to the first input terminal via the signal line and the switching element; opening the switching element; supplying a second voltage to the second input terminal via the signal line; and comparing the first and second voltages using the voltage comparator, wherein the first voltage represents a memory state of a memory cell, and the second voltage is a reference voltage which represents a memory state of a reference cell, or vice versa.

Integrated circuit with Resistivity changing memory cells and methods of operating the same

The present invention relates to a memory circuit and method of operating the same. In at least one embodiment, the memory circuit includes a resistive memory element coupled to a plate potential by a first terminal; a bit line which is connectable to a second terminal of the resistive memory element; a programming circuit operable to change the resistance of the resistive memory element; a bleeder circuit operable to provide a bleeding current to or from the bit line due to a change of the resistance of the resistive memory element caused by the programming circuit.

Memory circuit including a resistive memory element and method for operating such a memory circuit

Provided is a resistive memory arrangement having a cell array structured in rows and columns and having resistive memory cells connected to a drive element for driving. Each drive element is jointly connected to n cell resistors forming a memory cell, the cell resistors being CBRAM resistance elements, in particular, and also to a writing, reading and erasing method for a resistive memory arrangement realized with CBRAM resistance elements.

Resistive memory arrangement

The present invention is related to a memory circuit comprising: a resistive memory element comprising a programmable metallization cell, a bit line, a selection transistor operable to address the resistive memory element for coupling the resistive memory element to the bit line, and a further transistor coupled with the resistive memory element for applying a predefined potential at a node between the selection transistor and the resistive memory element.

Memory circuit, method for operating a memory circuit, memory device and method for producing a memory device

A memory device and method of operating the same. In one embodiment, the memory device includes a resistive memory cell including a resistive memory element wherein the resistive memory element is designed to acquire a low resistance state when applying a programming voltage and acquire to a high resistance state when applying an erasing voltage; and wherein the writing time for changing the resistance state of the resistive memory element can be relatively reduced.

Resistive memory device and method for writing to a resistive memory cell in a resistive memory device

A memory device and method for operating a memory device is described. In one embodiment, the memory device has at least one memory cell including an active material, a current supply line, and a first switching device for switching a first current from the current supply line through the active material. The memory cell additionally includes at least one further switching device for switching a further current from the current supply line through the active material.

Memory device and method for operating such a memory device

A semiconductor memory device includes resistance memory elements that are coupled to selection transistors addressed by word lines and bit lines. The memory elements are read by read/write lines arranged parallel to the word lines. Two successive memory elements along a read/write line are coupled to selection transistors that are coupled to different word lines.

Semiconductor memory device

The invention relates to a method for reading a memory datum from a resistive memory cell comprising a selection transistor which is addressable via a control value, the method comprising detecting a cell current flowing through the resistive memory cell, setting the control value depending on the detected cell current, and providing an information associated to the control value as a memory datum.

Method and memory circuit for operating a resistive memory cell

To manufacture a memory device, a gate dielectric layer is formed over a semiconductor body and a gate electrode layer is formed over the gate dielectric layer. The gate electrode layer is structured to form a gate electrode with sidewalls. An etching process is performed to remove parts of the gate dielectric layer from beneath the gate electrode on opposite sides of the gate electrode. Boundary layers, e.g., oxide layers, are formed on an upper surface of the semiconductor body and a lower surface of the gate electrode adjacent where the gate dielectric has been removed thereby leaving spaces. Charge-trapping layer material can then be deposited to fill the spaces. Source and drain regions are then formed in the semiconductor body adjacent the gate electrode.

Charge-trapping memory device and methods for operating and manufacturing the cell

A method and a circuit configuration for generating a reference voltage in a resistive semiconductor memory includes generating a reference voltage by connecting together two bitlines having different voltages. This method for generating a reference voltage can be used in a method and in a circuit configuration for reading at least one memory cell of a resistive memory cell array in a semiconductor memory. The generated reference voltage and a voltage dependent on the content of a resistive memory cell are applied to an amplifier to determine the content of the memory cell. The content of the memory cell is determined dependent on a relationship between the reference voltage and the voltage dependent on the content of the memory cell.

Methods for generating a reference voltage and for reading a memory cell and circuit configurations implementing the methods

A memory device includes an array of memory cells that include a memory element having a non-reactive resistance whose magnitude is programmable to assume a high-resistance state or a low-resistance state. Sets of first and second lines provide access to the memory cells, wherein the memory element of each memory cell is coupled between one of the first lines and one of the second lines. A checking unit determines whether to invert data values to be stored in memory cells coupled to at least a section of respective ones of the first lines based on a number of memory cells that would be programmed in the high-resistance state or the low-resistance state as a result of the data values in order to reduce the number memory cells programmed in the low-resistance state and the resulting leakage current.

Integrated memory device and method for operating the same

In integrated semiconductor memories whose stored information is represented by the magnitude of the ohmic resistance of layer stacks with a respective layer comprising a solid electrolyte, the problem arises that although the fact that the large threshold values (G, G) for the writing voltage and the erasure voltage differ from memory cell to memory cell means that the memory cells can be programmed individually, said memory cells cannot conventionally be erased individually, i.e., selectively in relation to the other memory cells. The reason for this is the large bandwidth of the threshold values (G) for the erasure voltages, which ranges from a potential (Verasemin) to a potential (Verasemax). The invention proposes a semiconductor memory and a method for operating the latter, in which simultaneous biasing of all the bit lines and word lines and a specific choice of the electrical potentials allow a single memory cell to be erased selectively in relation to the other memory cells.

Integrated semiconductor memory with an arrangement of nonvolatile memory cells, and method

An array of charge-trapping multi-bit memory cells is arranged in a virtual-ground NAND architecture. The memory cells are erased by Fowler-Nordheim tunneling of electrons into the memory layers. The write operation is effected by hot hole injection. A write voltage is applied by a bitline to two NAND chains in series. The subsequent bitline on the side of the memory cell to be programmed is maintained on floating potential, whereas the bitline on the other side is set to an inhibit voltage, which is provided to inhibit a program disturb of an addressed memory cell which is not to be programmed. This virtual-ground NAND architecture of charge-trapping memory cells enables an increased storage density.

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Munich, Germany

Corvin Liaw