Asml Netherlands B.v.

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Cornelius Maria Rops

Erik Henricus Egidius Catharina Eummelen

Michel Riepen

Rogier Hendrikus Magdalena Cortie

Giovanni Luca Gattobigio

Theodorus Wilhelmus Polet

Nicolaas Ten Kate

David Bessems

Ruud Olieslagers

Ronald Van Der Ham

Nicolaas Rudolf Kemper

Han Henricus Aldegonda Lempens

Pepijn Van Den Eijnden

Gerben Pieterse

Jimmy Matheus Wilhelmus Van De Winkel

Johannes Cornelis Paulus Melman

Miao Yu

Patrick Johannes Wilhelmus Spruytenburg

Artunç Ulucan

Niek Jacobus Johannes Roset

Jim Vincent Overkamp

Gheorghe Tanasa

Koen Cuypers

Mark Johannes Hermanus Frencken

Henricus Jozef Castelijns

Harold Sebastiaan Buddenberg

Evert Van Vliet

Floor Lodewijk Keukens

Marcel Maria Cornelius Franciscus Teunissen

Jantien Laura Van Erve

Johannes Jacobus Matheus Baselmans

Theodorus Marinus Modderman

Koen Steffens

Laurentius Johannes Adrianus Van Bokhoven

Marcus Martinus Petrus Adrianus Vermeulen

Paul Petrus Joannes Berkvens

Christianus Wilhelmus Johannes Berendsen

Robertus Nicodemus Jacobus Van Ballegoij

Hubert Marie Segers

Christophe De Metsenaere

Bart Smeets

Victor Manuel Blanco Carballo

Marcus Johannes Van Der Zanden

Jozef Augustinus Maria Alberti

Aart Adrianus Van Beuzekom

Willem Jan Bouman

Francis Fahrni

Frederik Antonius Van Der Zanden

Martinus Wilhelmus Van Den Heuvel

Walter Theodorus Matheus Stals

Paul Van Dongen

Paul Willems

Bas Willems

Wilhelmus Antonius Wernaart

Nina Vladimirovna Dziomkina

Takeshi Kaneko

Fabrizio Evangelista

Johan Franciscus Maria Beckers

Adrianes Johannes Baeten

Sandra Van Der Graaf

Frederik Van Der Graaf

Johannes Fransiscus Maria Velthuis

Ronald Frank Kox

Nirupam Banerjee

Adrianus Marinus Verdonck

Leon Ferdinand Gerard Geers

Rik Vangheluwe

Mike Paulus Johannes Van Gils

Wouterus Jozephus Johannes Van Sluisveld

Dagmar Antoinette Wismeijer

Jan Eite Bullema

Leon FG Geers

Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

Fluid handling system, method and lithographic apparatus

A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.

The present document relates to an electrode for use in a layered device structure, the electrode comprising at least one layer of conductive material, wherein the electrode comprises at least one micro evaporator having an evaporator inlet for receiving a cooling fluid and an evaporator outlet for removing the cooling fluid after evaporation, wherein the micro evaporator includes a plurality of micro channels forming an evaporation volume, the micro channels being embedded in the layer of conductive material. The present document further relates to a battery design including such an electrode.

Electrode for use in a layered device structure, as well as a battery device

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A method for recovering heat from a flue gas from an engine and a heat recovery system are described. The method involves contacting coolant in a vaporization chamber with a plurality of flow-modifying structures. The structures are arranged in series in the direction of the flow of coolant liquid and are each configured for modifying the flow of the coolant liquid and the vapour in said vaporization chamber.

Method and system for heat recovery

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

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Waalre, Netherlands

Cornelius Maria Rops