Stichting Dutch Polymer Institute

Cornelis Wilhelmus Maria Bastiaansen

Rintje Pieter Sijbesma

Jan Dirk Broer

Itsuro Tomatsu

Ko Hermans

Jolke Perelaer

Ulrich Sigmar Schubert

The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30&#xb0; C. and 120&#xb0; C.

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Eindhoven, Netherlands

Cornelis Wilhelmus Maria Bastiaansen