Asm IP Holding B.v.

Cornelis Thaddeus Herbschleb

Dieter Pierreux

Bert Jongbloed

Werner Knaepen

Lucian C Jdira

Hessel Sprey

Theodorus Oosterlaken

Steven Van Aerde

Kelly Houben

Chris De Ridder

The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

Substrate processing apparatus and method

The invention relates to a substrate rack and a substrate processing system for processing substrates in a reaction chamber. The substrate rack may be used for introducing a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the substrates in a spaced apart relationship. The rack may have an illumination system to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

Substrate rack and a substrate processing system and method

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Leiden, Netherlands

Cornelis Thaddeus Herbschleb