Asml Netherlands B.v.

Cornelis Cornelia De Bruijn

Derk Jan Wilfred Klunder

Huibert Visser

Frederik Bijkerk

Oscar Franciscus Jozephus Noordman

Fabrizio Evangelista

Henri Johannes Petrus Vink

Marcus Gerhardus Hendrikus Meijerink

Koenraad Remi André Maria Schreel

Henryk Fiedorowicz

Andrzej Bartnik

A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode () provided on a face () of a semiconductor substrate () towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material () being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material () is provided on a side () of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.

Lithographic apparatus, sensor and method

A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.

Radiation beam pulse trimming

A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle constructed and arranged to eject a primary gas or liquid in a first direction; a supply for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle constructed and arranged to eject a secondary gas or liquid in the first direction and positioned aside, possibly enclosing, the primary jet nozzle ; and a supply for the secondary gas or liquid.

Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus

Growing community of inventors

Sprundel, Netherlands

Cornelis Cornelia De Bruijn