Eastman-kodak Company

Constantine C Petropoulos

George A Reynolds

Robert C Daly

James A Van Allan

James A VanAllan

Robert H Fehnel

Frederick J Rauner

Zoilo C Tan

Carl T Brozek

A copolyester is synthesized by reacting a dialkyl ester of an aromatic dicarboxylic acid (e.g., dimethyl terephthalate) with ethylene glycol, low molecular weight poly(ethylene glycol) and a salt of a sulfonic acid-substituted aromatic dicarboxylate (e.g., sodium sulfoisophthalic acid) simultaneously in a first stage reaction in the presence of a phosphite or phosphate stabilizer. The intermediate product of the first stage is further reacted in a second stage in the presence of a polycondensation catalyst to obtain a random copolyester of the desired molecular weight. The copolyester is extruded to form a film which, after orientation and heat setting, has excellent clarity and is useful as a photographic film support. Aqueous processing of the film relaxes any core set or curl.

Modified polyester useful as photographic roll film support

Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.

Negative-working polymers useful as electron beam resists

Pyrylium, thiapyrylium and selenapyrylium salts and derivatives thereof having a trimethine linkage containing an aryl substituent attached to at least one carbon atom of the trimethine linkage are disclosed. Radiation sensitive compositions, e.g., photoconductive compositions, containing such materials are also disclosed.

Novel radiation sensitive compounds and radiation sensitive compositions

Radiation sensitive compositions containing pyrylium compounds

Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.

Radiation sensitive polymeric o-nitrophenyl acetals and element

Radiation sensitive polymeric o-nitrophenyl acetals

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Webster, NY, United States of America

Constantine C Petropoulos