Akrion Systems, LLC

Akrion Technologies, Inc.

Cole Franklin

Yi Wu

Brian Fraser

Mark Rouillard

Yan Fan

Thomas Nicolosi

A dual sided display includes a display projector. The display projector includes a lamp and a display projector image. The display projector image has pixels and the pixels produce light as light rays. The display includes a display panel that has an upper edge, a lower edge, a left edge and a right edge. The display panel is formed of a substrate that is translucent or transparent. A display panel first viewing surface is formed on the first side of the display panel. A display panel second viewing surface is formed on the second side of the display panel. The wherein the display panel first viewing surface is parallel to and opposing the display panel second viewing surface. The display panel has a thickness. A displayed image is displayed on the display panel first viewing surface and the display panel second viewing surface simultaneously.

Dual sided display

A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

Spray jet cleaning apparatus and method

A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.

Megasonic cleaning using supersaturated solution

A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.

Megasonic cleaning using supersaturated cleaning solution

A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of fine-structured wafers, through application of an acoustic field to the wafer through a cleaning liquid which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer.

Growing community of inventors

San Clemente, CA, United States of America

Cole Franklin