Asml Netherlands B.v.

Asml Holding N.v.

Coen Hubertus Matheus Baltis

Yuri Johannes Gabriël Van De Vijver

Siegfried Alexander Tromp

Günes Nakiboglu

Daan Daniel Johannes Antonius Van Sommeren

Niek Jacobus Johannes Roset

Thomas Poiesz

Marcus Martinus Petrus Adrianus Vermeulen

Abraham Alexander Soethoudt

Gijs Kramer

Bert Dirk Scholten

Justin Johannes Hermanus Gerritzen

Thibault Simon Mathieu Laurent

Patrick Sebastian Uebel

Martijn Houben

Sebastian Thomas Bauerschmidt

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Peter Maximilian Götz

Jorge Alberto Vieyra Salas

Mark Johannes Hermanus Frencken

Aleksandar Nikolov Zdravkov

Mehmet Ali Akbas

Harold Sebastiaan Buddenberg

Simon Karel Ravensbergen

Marcel Maria Cornelius Franciscus Teunissen

Nicholas Peter Waterson

Janneke Ravensbergen

Walter Theodorus Matheus Stals

Josephus Peter Van Lieshout

Vincentius Fransiscus Cloosterman

Dennis Van Den Berg

Wouter Vanesch

Nicolaas Ten Kate

Andre Bernardus Jeunink

Youssef Karel Maria De Vos

Johannes Cornelis Paulus Melman

André Schreuder

Frank Pieter Albert Van Den Berkmortel

Jeroen Van Duivenbode

Ringo Petrus Cornelis Van Dorst

Evelyn Wallis Pacitti

Arie Cornelis Scheiberlich

Petrus Johannes Van Den Oever

Jelmer Mattheüs Kamminga

Petrus Jacobus Maria Van Gils

Nicolaas Petrus Marcus Brantjes

Johannes Cornelius Paulus Melman

Michiel Theodorus Jacobus Fonteyn

Dirk Jerome Andre Senden

Robby Franciscus Josephus Martens

Gerhard Albert Ten Brinke

Peter Maximilian GÖTZ

A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

Substrate support and substrate table

A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

Substrate holder for use in a lithographic apparatus

Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.

Hollow-core photonic crystal fiber based optical component for broadband radiation generation

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

Substrate holder, a lithographic apparatus and method of manufacturing devices

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

An apparatus for removing particles from a clamp, the apparatus being arrangeable in proximity of the clamp and comprising an insulating portion, a supporting portion, at least a part or all of the insulating portion being arranged on the supporting portion, wherein the supporting portion is configured such that when a voltage is applied to the supporting portion of the apparatus and/or to an electrode of the clamp, the supporting portion acts as an electrode to allow an electric field to be generated between the apparatus and the clamp for removal of the particles from the clamp.

Particle removal apparatus and associated system

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

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Eindhoven, Netherlands

Coen Hubertus Matheus Baltis