Lam Research Corporation

Novellus Systems Incorporated

Cody Barnett

Mohamed Sabri

Adrien Lavoie

Shankar Swaminathan

Frank Loren Pasquale

Sesha Varadarajan

Saangrut Sangplung

Ted Minshall

Karl Frederick Leeser

Douglas L Keil

Edward J Augustyniak

Ramkishan Rao Lingampalli

Ravi Kumar

Mitali Mrigendra Basargi

Karthik Adappa Sathish

Baffle for substrate processing system

A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate. A gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber. A plasma generator is configured to selectively generate RF plasma in the reaction volume. A clamping system is configured to clamp the substrate to the substrate support during deposition of the film. A backside purging system is configured to supply a reactant gas to a backside edge of the substrate to purge the backside edge during the deposition of the film.

Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges

A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material.

Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor

Growing community of inventors

Portland, OR, United States of America

Cody Barnett