Az Electronic Materials USA Corp.

Az Electronic Materials (luxembourg) S.a.r.l.

Az Electronics Materials (luxembourg) S.a.r.l.

Merck Patent Gmbh

Clement Anyadiegwu

M Dalil Rahman

Douglas S McKenzie

Munirathna Padmanaban

Salem K Mullen

Ralph R Dammel

JoonYeon Cho

Francis Michael Houlihan

Huirong Yao

Takanori Kudo

David L Rentkiewicz

SangHo Lee

Jianhui Shan

Yi Cao

Alberto D Dioses

SungEun Hong

Elizabeth Wolfer

Muthiah Thiyagarajan

Wenbing Kang

Venkata Gopal Reddy Chada

Dalil M Rahman

Wen-Bing Kang

Douglas Mckenzie

The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.

Stable metal compounds, their compositions and methods

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R)(R) methylene moiety where Rand Rare independently H, C-Calkyl, C-Ccycloalkyl or C-Caryl; Ar, Ar, Arand Arare independently phenylenic and naphthalenic moiety, Rand Rare independently hydrogen or C-Calkyl; and Rand Rare independently hydrogen or C-Calkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating compositions and processes thereof

The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.

Spin-on compositions of soluble metal oxide carboxylates and methods of their use

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where Ris C-Calkyl, Ris C-Calkyl, Rand Rare independently hydrogen or C-Calkyl, and Ar' and Ar&#x2033; are independently phenylenic, or naphthalenic derived moieties, Rand Rare independently &#x2014;OH or &#x2014;(CH)OH where n=2-4, and Rand Rare independently hydrogen or C-Calkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):-A-B-C-&#x2003;&#x2003;(1)where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R', R&#x2033;and R&#x2032;&#x2033;are independently hydrogen or a C-Calkyl. The invention further relates to a process for forming an image using the composition.

The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH),&#x2009;represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Composition for coating over a photoresist pattern comprising a lactam

The present application relates to a compound of formula A-X&#x2014;B, where (i) A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii) A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Photoactive compounds

The present application relates to a compound of formula A-X&#x2014;B, where (i)A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii)A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

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Parlin, NJ, United States of America

Clement Anyadiegwu