Merck Patent Gmbh

Merck Patent Gesellschaft MIT Beschrankter Haftung

Claus Dusemund

Martin Hostalek

Klaus Freissler

Ulrich Finkenzeller

Rudolf Rhein

Thomas Schwortschik

Eberhard Tempel

Ewald Neumann

Wilfried Jammer

Michael Poth

Alberto Dix

Dietmar Oeter

Manuela Schweikert

The invention relates to a novel chromatographic process for the further purification of hydrogen peroxide solutions, giving high-purity solutions which can be employed in semiconductor technology under today's high purity requirements.

Method for the purification of hydrogen peroxide solutions

The present invention relates to a novel supply system for chemicals which permits the preparation of solid-containing suspensions, which are required, inter alia, for polishing wafers or in semiconductor production, directly at the point of use.

Supply system for chemicals and its use

A system tot the pulsation-free delivery of liquids, which system may be used for high-purity, liquid chemicals in the semiconductor industry.

System for conveying liquids without pulsing

The present invention relates to buffer systems in the form of solutions or salts for preparing suspensions which can be used for chemomechanical polishing. In particular, these buffer systems can be used for preparing suspensions having a high pH of 9.5-13 which are used for the chemomechanical polishing of Si and metal surfaces of semiconductors, known as wafers.

Buffer solutions for suspensions used in chemical-mechanical polishing

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Singapore, Singapore

Claus Dusemund