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Universitá Degli Studi Di Milano-Bicocca

Universita' Degli Studi Milano-bicocca

Plume S.r.l.

Pirelli Tyre S.p.a.

Politecnico Di Milano

Innovhub - Stazioni Sperimentali Per L'industria

Claudia Riccardi

Simone Agresti

Barbara Rampana

Paola Caracino

Stefano Zanini

Fabio Di Fonzo

Moreno Piselli

Matteo Daghetta

Elisa Dell'orto

Francesco Sirio Fumagalli

Dario Tassetti

Carlo Enrico Bottani

Carlo Maria Gaifami

Antonino Raffaele Addamo

Bruno Marcandalli

Maria Rosaria Massafra

The present invention relates to a method for generating atmospheric plasmas not in thermodynamic equilibrium with the control of ozone generation and, in particular, the generation of atmospheric plasmas not in thermodynamic equilibrium with a production of ozone contained below 0.5 ppmv, and preferably below the limit of 0.2 ppmv.

Method for the generation under dynamic conditions of an atmospheric plasma with a low ozone content and a surface discharge system with dielectric barrier for the realization of the method

Process for the plasma surface treatment under vacuum of a fabric, nonwoven fabric or paper material for obtaining materials to be used for the filtration and separation of two immiscible liquids.

Superficially treated flexible materials suitable for filtering and separating immiscible liquids

The present invention relates to a method for coating a substrate comprising the following steps: a) depositing a polymerizable composition on said substrate, the composition being selected from the following compositions:

Polymeric film coating method on a substrate by depositing and subsequently polymerizing a monomeric composition by plasma treatment

A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber () is provide in which are present an injector () of a reagent gas, means (') for feeding inert gases, and an antenna () for the creation of a plasma in said first chamber. Enclosing said first chamber is a second chamber () to which a pumping system is connected, containing a housing for the substrate () on which the nanostructured film is produced. A wall () separates said first chamber from said second chamber and has at least one opening (). The injector and antenna are arranged in the first chamber with a geometry such that the distance between the outlet of said injector is at a distance of no more than 5 cm from the plane of the surface of said antenna farther from said wall, and said surface is at a distance of no more than 5 cm from said opening.

Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure

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Milan, Italy

Claudia Riccardi