Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Claudia Ekstein

Armin Schoeppach

Ulrich Bingel

Gerd Klose

Gennady Fedosenko

Stefan Wiesner

Leonid Gorkhover

Holger Maltor

Michael Widmann

Hans-Joachim Trefz

Guenter Albrecht

Hubert Holderer

Udo Dinger

Johannes Lippert

Johannes Rau

Martin Weiser

Heiko Siekmann

Johnannes Rau

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates () including a base body () made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body () is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer () is preferably provided on a polishing layer () of the substrate () of the EUV mirror ().

Substrate for an EUV-lithography mirror

A method and a device for the material-fit connection of an optical element to a frame are disclosed.

Method and device for connecting an optical element to a frame

Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body () and a polishing layer (). The polishing layer () has a thickness of less than 10 &#x3bc;m and a root-mean-square roughness of less than 0.5 nm and the main body () is produced from an aluminum alloy. Moreover, a highly reflective layer () is provided on the polishing layer () of the substrate () of the EUV mirror ().

Substrate for mirrors for EUV lithography

A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (MgAlSiO) or of silicon carbide (SiC). Also disclosed is an optical arrangement, in particular a projection illumination apparatus for microlithography, having at least one such composite structure, preferably a wafer stage.

Composite structure for microlithography and optical arrangement

Growing community of inventors

Ellwangen, Germany

Claudia Ekstein