Corning Incorporated

Claude L Davis, Jr

Kenneth Edward Hrdina

Robert Sabia

Harrie J Stevens

Nicholas Francis Borrelli

Bradley Frederick Bowden

Thomas William Hobbs

Bradford Giles Ackerman

Gregory L Murray

Mary J Edwards

Michael E Best

Michael W Linder

The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system () for producing and directing an extreme ultraviolet soft x-ray radiation &#x3bb; from an extreme ultraviolet soft x-ray source (); a mask stage () illuminated by the extreme ultraviolet soft x-ray radiation &#x3bb; produced by illumination stage and the mask stage () includes a pattern when illuminated by radiation &#x3bb;. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface () and printed media subject wafer which has a radiation sensitive surface.

Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements

A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.

Method to avoid striae in EUV lithography mirrors

The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;. Providing the patterned reflective mask includes providing a Ti doped high purity SiO glass wafer with a patterned absorbing overlay overlaying the reflective multilayer coated Ti doped high purity SiO glass defect free wafer surface that has an Ra roughness&lE;0.15 nm. The method includes providing a projection sub-system and a print media subject wafer which has a radiation sensitive wafer surface wherein the projection sub-system projects the projected mask pattern from the patterned reflective mask onto the radiation sensitive wafer surface.

Extreme ultraviolet soft x-ray projection lithographic method and mask devices

A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.

Silica-based light-weight EUV lithography stages

An inexpensive lightweight mirror blank having good dimensional stability, and a method of making the same is provided. The mirror blank includes an extruded ceramic honeycomb core and a faceplate bonded or otherwise affixed to the front surface of the core. The extruded honeycomb core is comprised of a matrix of cell walls defining an array of cells, with the number of cells being greater than about 16 cells per square inch, to render the core extremely light in weight yet sufficiently rigid and strong to support the optical faceplate. The faceplate is formed from a material that is capable of being polished to an optical surface. An optional back plate can be bonded or otherwise affixed to the back surface of the core in order to improve stiffness and mechanical stability of the mirror blank.

Low cost light weight mirror blank

A birefringent waveplate that is composed of an integral, transparent, glass body, the glass body consisting of non-absorbing crystalline particles dispersed in a glassy matrix, the dispersed crystalline particles being selected from the group consisting of copper chloride, copper bromide and mixtures thereof, the dispersed crystalline particles having a high aspect ratio and being oriented and aligned along a common axis, whereby the waveplate is rendered birefringent so that polarized components of light transmitted through the waveplate have a phase shift introduced.

Birefringent glass waveplate containing copper halide crystals

An integral optical train comprising a plurality of optical components including a polarized glass element and a light-altering optical element. The polarized glass element may be a glass containing elongated particles of a silver halide selected from the group consisting of AgCl, AgBr and AgI, and the optical element may be a lens or a mirror.

Growing community of inventors

Painted Post, NY, United States of America

Claude L Davis, Jr