Ebauches S.a.

Claude Ganguillet

Yves Ruedin

Jacques Cognard

Michel Sallin

Jean-Paul Ehrbar

An electrochromic display cell comprises a frame interposed between an ionic conductor and an annular soldered zone sealing a cover of the cell to a substrate of the cell. The frame is squeezed between the cover and the substrate to tightly separate the ionic conductor and the solder, preventing any reaction therebetween. In a preferred embodiment, the frame is made of a thermofusible material. It partially melts during the sealing of the cell, adhering thus very tightly to the cover and to the substrate.

Electrochromic display cell

To prepare a masking agent resistant to temperature, one adds silica powder to a photoresist. The mixture thus obtained is used to produce selective deposition of a layer of material on a substrate. The mixture of photoresist and silica powder serves as a photo-sensitive protective material which is then eliminated partially by selective exposure to light and use of a photographic developer. The temperatures involved in the deposition of the layer of desired material, for instance tin oxide, are about 500.degree. C. (deposition in the vapor phase), and the photo-sensitive material would be liable to destruction if it did not contain silica powder. It is then necessary, once the deposition of the desired material has been effected, to increase the temperature of the workpiece up to about 540.degree. C. to destroy and, hence, to eliminate the protective material.

Masking agent for the deposition of a material and method for such a

Method for pretreating a plastic substrate prior to metallization thereof by electroless metal deposition by applying a brush discharge thereto, the current density of which is higher than 0.5 mA/cm.sup.2, the tension of which being less than the breakdown tension of the substrate and the total charge of energy applied being no higher than 20mC/cm.sup.2 ; the treatment comprising plural short spaced exposures of said substrate to said discharge. Various masking means are employed to provide selectively treated and untreated portions on the substrate.

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Neuchatel, Switzerland

Claude Ganguillet